A next generation ion source suitable for both high resolution focused ion beam milling and imaging applications is currently being developed. The new ion source relies on a method of which positively charged ions are extracted from a miniaturized gas chamber where neutral gas atoms become ionized by direct electron impact. The use of a very small gas chamber and a very narrow electron beam (<100 nm) allows for a very small ionization volume, which, in turn, yields a small virtual source size and low energy spread. The authors estimate that using a high current density electron beam from a Schottky electron gun the reduced brightness of this source can exceed that of the Gallium Liquid Metal Ion Sources and the energy spread can be well bel...
Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ab...
Copyright © 2014 Muhammad Zubair Khan et al. This is an open access article distributed under the Cr...
We demonstrate a prototype of a Focused Ion Beam machine based on the ionization of a laser-cooled c...
A next generation ion source suitable for both high resolution focused ion beam milling and imaging ...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
The scanning ion microscopy is gaining momentum as it provides several key advantages over scanning ...
High-brightness ion sources are important for several applications such as focussed ion beam (FIB) s...
A new, compact design of an ion source delivers nanosecond pulsed ion beams with low emittance, whic...
The energy spreads of ion beams generated from a penning ionization gauge-type ion source with elect...
AbstractIn this work, historical review about different kinds of ion sources and their applications ...
Mini RF-driven ion sources with 1.2 cm and 1.5 cm inner chamber diameter have been developed at Lawr...
UltraCold Ion Beam Source. Focused ion beam (FIB) machines are largely used in the semiconductor ind...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ab...
Copyright © 2014 Muhammad Zubair Khan et al. This is an open access article distributed under the Cr...
We demonstrate a prototype of a Focused Ion Beam machine based on the ionization of a laser-cooled c...
A next generation ion source suitable for both high resolution focused ion beam milling and imaging ...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
The scanning ion microscopy is gaining momentum as it provides several key advantages over scanning ...
High-brightness ion sources are important for several applications such as focussed ion beam (FIB) s...
A new, compact design of an ion source delivers nanosecond pulsed ion beams with low emittance, whic...
The energy spreads of ion beams generated from a penning ionization gauge-type ion source with elect...
AbstractIn this work, historical review about different kinds of ion sources and their applications ...
Mini RF-driven ion sources with 1.2 cm and 1.5 cm inner chamber diameter have been developed at Lawr...
UltraCold Ion Beam Source. Focused ion beam (FIB) machines are largely used in the semiconductor ind...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Pulsed and continuous ion beams are used in applications, such as focused ion beams. The smallest ac...
Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ab...
Copyright © 2014 Muhammad Zubair Khan et al. This is an open access article distributed under the Cr...
We demonstrate a prototype of a Focused Ion Beam machine based on the ionization of a laser-cooled c...