Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improves the properties of deposited layers. The understanding and control of phenomena taking place during pulsed DC sputtering requires new time-resolved methods of investigation. This thesis presents a comprehensive development of new methods for magnetron design and time-resolved plasma diagnostic, based on Monte Carlo simulations and timeresolved plasma physical models derived for a pulsed DC opposed target magnetron discharge with rectangular geometry. The numerical methods have been developed and benchmarked by the author through extensive numerical experiments. A representative set of application examples is included. The time-resolve...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Elektronové rozdělovací funkce podle energie a lokální plazmové parametry byly zkoumány v pozici u s...
Time-resolved images of the optical emissions from a pulsed dc titanium target planar rectangular sp...
Time-resolved images of the optical emissions from a pulsed dc titanium target planar rectangular sp...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Elektronové rozdělovací funkce podle energie a lokální plazmové parametry byly zkoumány v pozici u s...
Time-resolved images of the optical emissions from a pulsed dc titanium target planar rectangular sp...
Time-resolved images of the optical emissions from a pulsed dc titanium target planar rectangular sp...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...
Research on the characterisation and understanding of pulsed magnetron discharges used for the depos...