Neutron and x-ray Reflectometry Investigations of Amorphous Silicon-based Surface Passivation Layers

  • Marstein, Erik S.
  • Hasle, Ida M.
  • Qviller, Atle J.
  • Haug, Halvard
Publication date
December 2014
Publisher
Published by Elsevier Ltd.

Abstract

AbstractIn this work, films of a-Si:H films exhibiting low surface recombination velocities were deposited onto high lifetime silicon substrates and characterized. The films were made by plasma enhanced chemical vapour deposition with thicknesses ranging from 5 to 40nm. On one set of samples, the a-Si:H layers was capped by a ∼100nm layer of amorphous, hydrogenated silicon nitride (a-SiNx:H). The thermal stability of the surface passivation materials was investigated by minority carrier lifetime measurements. The structure and composition of the films were thereafter investigated both before and after annealing using neutron reflectometry (NR) and x-ray reflectometry (XRR) measurements. These measurements give highly accurate information of...

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