Optimization of Cs Deposition in the 1/3 Scale Hydrogen Negative Ion Source for LHD-NBI System

  • Y. "Oka
  • Y. Takeiri
  • Belchenko Yu.I.
  • M. Hamabe
  • O. Kaneko
  • K. Tsumori
  • M. Osakabe
  • E. Asano
  • T. Kawamoto
  • R." Akiyama
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Publication date
December 1999
Journal
issn:0915-633X

Abstract

"A compact cesium deposition system was used for direct deposition of cesim atoms and ion onto the inner surface of the 1/3 scale Hydrogen Negative Ion Source for the LHD-NBI system. A small, well defined amount of cesium deposition in the range of 3-200 mg was tested. Negative ion extraction and acceleration were carried out both in the pure hydrogen operation mode and in the cesium mode. Single Cs deposition of 3-30 mg to the plasma chamber have produced temporary 2-5 times increases of H- yield, but the yield was decreased within several discharge pulses to the previous steady-state value. Two consecutive 30 mg depositions done within a 3-5 hours/ 60 shot interval, produced a similar temporary increase of H- beam, but reached a larg...

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