Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic structure along (220) orientation. The optical transmittance and band gap values of the films increased with increasing the oxygen partial pressure from 1 × 10 – 4 to 5 × 10 – 4 mbar and decreased on further increasing the oxygen partial pressure. Using Scanning Electron Microscopy (SEM), fine grains were observed at oxygen partial pressure of 5 × 10 – 4 mbar. The film resistivity decreases from 90.48 to 13.24 Ω cm with increase in oxygen partia...
AbstractElectrical properties of p-NiO films fabricated by RF magnetron sputtering were characterize...
A simple and cheap chemical deposition method was used to produce a nickel oxide (NiO) thin film on ...
In the present investigation, nanocrystalline NiO thin films were prepared by thermal oxidation anne...
Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at differ...
Non-stoichiometric Ni1-xO thin films were prepared on glass substrate by direct current reactive mag...
International audienceNickel oxide thin films were deposited by Direct Current magnetron reactive sp...
AbstractNickel Oxide (NiO) thin films have been deposited by dc reactive magnetron sputtering techni...
International audienceIn this paper, we characterize high transparency p-type semiconducting NiO thi...
Nickel oxide (NiO) thin films were formed by RF reactive magnetron sputtering onto glass substrates....
NiO thin films with varied oxygen contents are grown on Si(100) and c-Al2O3 at a substrate temperatu...
This work studies dependences of resistivity, carrier concentration, mobility and structural propert...
In this work, non stoichiometric nickel oxide (NiOx) thin films were deposited by r.f. reactive sput...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Nickel oxide(NiO)thin films were deposite donto glass substrates by the DC reactive magnetron sputte...
AbstractElectrical properties of p-NiO films fabricated by RF magnetron sputtering were characterize...
A simple and cheap chemical deposition method was used to produce a nickel oxide (NiO) thin film on ...
In the present investigation, nanocrystalline NiO thin films were prepared by thermal oxidation anne...
Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at differ...
Non-stoichiometric Ni1-xO thin films were prepared on glass substrate by direct current reactive mag...
International audienceNickel oxide thin films were deposited by Direct Current magnetron reactive sp...
AbstractNickel Oxide (NiO) thin films have been deposited by dc reactive magnetron sputtering techni...
International audienceIn this paper, we characterize high transparency p-type semiconducting NiO thi...
Nickel oxide (NiO) thin films were formed by RF reactive magnetron sputtering onto glass substrates....
NiO thin films with varied oxygen contents are grown on Si(100) and c-Al2O3 at a substrate temperatu...
This work studies dependences of resistivity, carrier concentration, mobility and structural propert...
In this work, non stoichiometric nickel oxide (NiOx) thin films were deposited by r.f. reactive sput...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Nickel oxide(NiO)thin films were deposite donto glass substrates by the DC reactive magnetron sputte...
AbstractElectrical properties of p-NiO films fabricated by RF magnetron sputtering were characterize...
A simple and cheap chemical deposition method was used to produce a nickel oxide (NiO) thin film on ...
In the present investigation, nanocrystalline NiO thin films were prepared by thermal oxidation anne...