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DOIAbstract
One of the most important features of the interface between an oxide and a metal is the sharp change in dielectric constant between the two materials. This suggests that the stabilisation of charges (lattice ions and defect centres) in the non-metal by the polarisation of the metal may contribute strongly to the interfacial adhesion. This effect can be treated in classical electrostatics by the method of images. We present the application of this theory to the adhesion of bulk materials and to the properties of thin films and coatings. The predictions of the continuum theory are compared with atomistic calculations of interfaces. Finally, we consider how, in light of this theory, how interfacial adhesion can be influenced and controlled