A refractory self-aligned gate fabrication process for gallium arsenide MESFETs has been developed and applied to a sample and hold circuit. The process has been shown to reduce the parasitic end resistance of MESFETs which can be a limiting factor in their microwave performance. A mask set was designed to be compatible with Cascade Inc. probes which allowed on chip microwave measurements to be made. Usable gain was measured up to 18GHz on FETs and 5GHz on buffer amplifiers with the microwave probes at the Communications Research Centre in Ottawa Ontario. The microwave probes were also used to test sample and hold operation. The maximum tested sampling rate was limited by the test equipment to 250 MHz. The fabrication process included a pl...
This thesis presents a ne- approach to the fabrication of short gate length HI-V High Electron Mobil...
The availability of high quality semi-insulating GaAs substrates is essential to the development of ...
The use of ion-beam etching for the controllable formation of very thin active channel layers in GaA...
The present paper is devoted to microwave transistors, developed in SRPC "Istok". Design, fabricatio...
This thesis describes work done towards the development of a gallium arsenide monolithic sample-and-...
The object of the work described in this thesis was to develop GaAs integrated circuit modeling tech...
The purpose of the work described in this thesis was to study the use of GaAs MESFETs in digital log...
Advanced integrated logic circuits on GaAs are mainly based on the using of n-channel field-effect t...
Gallium arsenide transistors have a distinct advantage over silicon in terms of speed, with much hig...
A novel technique for producing submicron gate length GaAs MESFETs has been developed. The technique...
Ankara : The Department of Physics and the Institute of Engineering and Science of Bilkent Universit...
date of the first integrated circuit to 1971 which has seen the first microprocessor application, th...
International audienceGaAs is for many people regarded as being too difficult and expensive for a se...
Two 2” Gallium Arsenide wafers underwent MBE deposition processing to create two differing epitaxial...
The purpose of the work described in this dissertation was to investigate the use of donor ion impla...
This thesis presents a ne- approach to the fabrication of short gate length HI-V High Electron Mobil...
The availability of high quality semi-insulating GaAs substrates is essential to the development of ...
The use of ion-beam etching for the controllable formation of very thin active channel layers in GaA...
The present paper is devoted to microwave transistors, developed in SRPC "Istok". Design, fabricatio...
This thesis describes work done towards the development of a gallium arsenide monolithic sample-and-...
The object of the work described in this thesis was to develop GaAs integrated circuit modeling tech...
The purpose of the work described in this thesis was to study the use of GaAs MESFETs in digital log...
Advanced integrated logic circuits on GaAs are mainly based on the using of n-channel field-effect t...
Gallium arsenide transistors have a distinct advantage over silicon in terms of speed, with much hig...
A novel technique for producing submicron gate length GaAs MESFETs has been developed. The technique...
Ankara : The Department of Physics and the Institute of Engineering and Science of Bilkent Universit...
date of the first integrated circuit to 1971 which has seen the first microprocessor application, th...
International audienceGaAs is for many people regarded as being too difficult and expensive for a se...
Two 2” Gallium Arsenide wafers underwent MBE deposition processing to create two differing epitaxial...
The purpose of the work described in this dissertation was to investigate the use of donor ion impla...
This thesis presents a ne- approach to the fabrication of short gate length HI-V High Electron Mobil...
The availability of high quality semi-insulating GaAs substrates is essential to the development of ...
The use of ion-beam etching for the controllable formation of very thin active channel layers in GaA...