The purpose of the work described in this thesis was to study the use of GaAs MESFETs in digital logic and digital to analog conversion. A part of this work was to test ideas by actually fabricating GaAs MESFET devices in our laboratory by implanting Si into LEC SI GaAs. Initially, the Rockwell "ion implanted planar process" was used. With this process high source and drain resistance result when the magnitude of the threshold voltage is reduced. A recessed gate process was then tried in order to reduce the series resistance, but it was difficult to control in order to achieve an acceptable uniformity. Sadler's self-aligned gate technique was then tried but an acceptable yield was found to be hard to achieve. Based on the experience with t...
The purpose of the work described in this dissertation was to investigate the use of donor ion impla...
To learn more about designing analog integrated circuits (ICs) at microwave frequencies using GaAs m...
We have successfully fabricated 0.1 µm gate GaAs MESFETs using a low cost process. The result was ob...
date of the first integrated circuit to 1971 which has seen the first microprocessor application, th...
The object of the work described in this thesis was to develop GaAs integrated circuit modeling tech...
A refractory self-aligned gate fabrication process for gallium arsenide MESFETs has been developed a...
The availability of high quality semi-insulating GaAs substrates is essential to the development of ...
Two 2” Gallium Arsenide wafers underwent MBE deposition processing to create two differing epitaxial...
The purpose of this work was to study certain aspects of device fabrication and material properties ...
The article of record as published may be found at https://doi.org/10.1109/23.488786An introduction ...
In this paper a possible implementation of digital circuits in a MMIC SAGFET/SAGHEMT technology is d...
95 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001.The high-performance GaAs MESF...
Gallium arsenide transistors have a distinct advantage over silicon in terms of speed, with much hig...
A complete design flow starting from the technological process development up to the fabrication of ...
We successfully obtained an 0.18µm gate MESFET with a high breakdown voltage (Vbd) of 7V, high curre...
The purpose of the work described in this dissertation was to investigate the use of donor ion impla...
To learn more about designing analog integrated circuits (ICs) at microwave frequencies using GaAs m...
We have successfully fabricated 0.1 µm gate GaAs MESFETs using a low cost process. The result was ob...
date of the first integrated circuit to 1971 which has seen the first microprocessor application, th...
The object of the work described in this thesis was to develop GaAs integrated circuit modeling tech...
A refractory self-aligned gate fabrication process for gallium arsenide MESFETs has been developed a...
The availability of high quality semi-insulating GaAs substrates is essential to the development of ...
Two 2” Gallium Arsenide wafers underwent MBE deposition processing to create two differing epitaxial...
The purpose of this work was to study certain aspects of device fabrication and material properties ...
The article of record as published may be found at https://doi.org/10.1109/23.488786An introduction ...
In this paper a possible implementation of digital circuits in a MMIC SAGFET/SAGHEMT technology is d...
95 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001.The high-performance GaAs MESF...
Gallium arsenide transistors have a distinct advantage over silicon in terms of speed, with much hig...
A complete design flow starting from the technological process development up to the fabrication of ...
We successfully obtained an 0.18µm gate MESFET with a high breakdown voltage (Vbd) of 7V, high curre...
The purpose of the work described in this dissertation was to investigate the use of donor ion impla...
To learn more about designing analog integrated circuits (ICs) at microwave frequencies using GaAs m...
We have successfully fabricated 0.1 µm gate GaAs MESFETs using a low cost process. The result was ob...