Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist
- Livanos, A. C.
- Katzir, A.
- Shellan, J. B.
- Yariv, A.
View in ORKG Publication date
June 1977 Publisher
Optical Society of AmericaAbstract
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer