Using current-sweep measurements, the set process in SiOx-based resistive random access memory (RRAM) has been found to consist of multiple resistance-reduction steps. Variation in set behaviors was observed and attributed to different defect distributions in the resistance switching region. Physical mechanism of electroforming process is discussed, which further explains the observed variation of defect distributions. A compliance current study confirms that the achievable memory states of SiOx RRAM are determined by its set behavior. This finding provides additional insight on achieving multi-bit memory storage with SiOx RRAM. (C) 2015 AIP Publishing LLC.Microelectronics Research Cente
Silicon oxide (SiOx) based resistive random access memory (ReRAM) devices are capable of changing re...
Graduation date: 2012Resistive random access memory (RRAM) is a non-volatile memory technology based...
Resistive switching (RS) based on the formation and rupture of conductive filament (CF) is promising...
Using current-sweep measurements, the set process in SiOx-based resistive random access memory (RRAM...
Resistive random access memory (RRAM) devices represent promising candidates for emerging non-volati...
A current sweep method is presented to probe the resistive switching behavior of hafnium-oxide-based...
In this letter, the instability mechanism of RRAM was investigated, and a technique was developed to...
Flash memory has been the fastest growing non-volatile memory technology, and it has been widely use...
We employ an advanced three-dimensional (3D) electro-thermal simulator to explore the physics and po...
This paper addresses the resistive switching behavior in yttrium oxide based resistive random access...
In order to obtain reliable multilevel cell (MLC) characteristics, resistance controllability betwee...
Resistive random access memory (RRAM) is the most promising candidate for non-volatile memory (NVM) ...
textFloating gate (FG) nonvolatile memory has been the main structure of nonvolatile memory devices,...
We use an experimentally-validated advanced three-dimensional physical simulator to investigate swit...
DThis letter investigates the double-ended resistive switching characteristics of indium tin oxide (...
Silicon oxide (SiOx) based resistive random access memory (ReRAM) devices are capable of changing re...
Graduation date: 2012Resistive random access memory (RRAM) is a non-volatile memory technology based...
Resistive switching (RS) based on the formation and rupture of conductive filament (CF) is promising...
Using current-sweep measurements, the set process in SiOx-based resistive random access memory (RRAM...
Resistive random access memory (RRAM) devices represent promising candidates for emerging non-volati...
A current sweep method is presented to probe the resistive switching behavior of hafnium-oxide-based...
In this letter, the instability mechanism of RRAM was investigated, and a technique was developed to...
Flash memory has been the fastest growing non-volatile memory technology, and it has been widely use...
We employ an advanced three-dimensional (3D) electro-thermal simulator to explore the physics and po...
This paper addresses the resistive switching behavior in yttrium oxide based resistive random access...
In order to obtain reliable multilevel cell (MLC) characteristics, resistance controllability betwee...
Resistive random access memory (RRAM) is the most promising candidate for non-volatile memory (NVM) ...
textFloating gate (FG) nonvolatile memory has been the main structure of nonvolatile memory devices,...
We use an experimentally-validated advanced three-dimensional physical simulator to investigate swit...
DThis letter investigates the double-ended resistive switching characteristics of indium tin oxide (...
Silicon oxide (SiOx) based resistive random access memory (ReRAM) devices are capable of changing re...
Graduation date: 2012Resistive random access memory (RRAM) is a non-volatile memory technology based...
Resistive switching (RS) based on the formation and rupture of conductive filament (CF) is promising...