The non-stationary transports effects in sub-100nm UTB MOSFET are investigated by using a 2-D self-consistent full-band Monte Carlo device simulator based on quantum Boltzmann equation. The results show the non-stationary transports affect the device characters significantly, the device drive current keep increasing due to the carriers velocity overshooting. The gate bias affects the carrier transports at source junction significantly.EI
Long-channel effective mobilities as well as transfer characteristics of a 32 nm single-gate SOI and...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...
This paper presents on-state characteristics of two types of UTB FD MOSFETs simulated by Monte Carlo...
The quantum Boltzmann equation (QBE) is solved using self-consistent ensemble full band Monte Carlo ...
Recent developments in the Monte Carlo method for the simulation of semi-classical carrier transport...
This paper investigates gate current through ultra-thin gate oxide of nano-scale metal oxide semicon...
Due to the rapid decrease in device dimensions the well-established TCAD tools are pushed to the lim...
UTB SOI device as a kind of no-conventional structure, are hope to take place of conventional CMOS i...
A recently developed self-consistent Monte-Carlo (MC) simulator of confined electron's transport in ...
A two-dimensional (2D) full band self-consistent ensemble Monte Carlo (MC) method for solving the qu...
In this paper, the ballistic and quasi-ballistic transport characteristics of Sub-30 nm double gate ...
Effect of surface roughness on quasi-ballistic transport in nano-scale Ge and Si double-gate (DG) MO...
In this paper, we review recent developments of the Monte Carlo approach to the simulation of semi-c...
We describe the multi-valley/multi-subband Monte Carlo (MV–MSMC) approach to model nanoscale MOSFETs...
Long-channel effective mobilities as well as transfer characteristics of a 32 nm single-gate SOI and...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...
This paper presents on-state characteristics of two types of UTB FD MOSFETs simulated by Monte Carlo...
The quantum Boltzmann equation (QBE) is solved using self-consistent ensemble full band Monte Carlo ...
Recent developments in the Monte Carlo method for the simulation of semi-classical carrier transport...
This paper investigates gate current through ultra-thin gate oxide of nano-scale metal oxide semicon...
Due to the rapid decrease in device dimensions the well-established TCAD tools are pushed to the lim...
UTB SOI device as a kind of no-conventional structure, are hope to take place of conventional CMOS i...
A recently developed self-consistent Monte-Carlo (MC) simulator of confined electron's transport in ...
A two-dimensional (2D) full band self-consistent ensemble Monte Carlo (MC) method for solving the qu...
In this paper, the ballistic and quasi-ballistic transport characteristics of Sub-30 nm double gate ...
Effect of surface roughness on quasi-ballistic transport in nano-scale Ge and Si double-gate (DG) MO...
In this paper, we review recent developments of the Monte Carlo approach to the simulation of semi-c...
We describe the multi-valley/multi-subband Monte Carlo (MV–MSMC) approach to model nanoscale MOSFETs...
Long-channel effective mobilities as well as transfer characteristics of a 32 nm single-gate SOI and...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...
In this paper, and in Part II, Monte Carlo (MC) simulations including quantum corrections to the pot...