Microstructure and Electrochemical Properties of PVD TiN, (Ti, Al) N-Coated Ti-Based Bulk Metallic Glasses

In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti40Zr10Cu36Pd14 bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by high-resolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks ’ solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating. [doi:10.2320/matertrans.ME200820