Ion sputtering at grazing incidence of the Cu(001) surface leads to the formation of a regular pattern of nanogrooves with a well defined separation distance between the grooves. The grooves are only two atomic layers deep for a low ion flux and their height remains the same independent of sputter time. The average separation distance of the nanogrooves is at least 5 nm and can be increased beyond 40 nm, depending on substrate temperature, fluence, the ion's mass and energy. Anneal experiments of a nanogroove pattern also show an increase in average nanogroove separation with anneal time. The increase of the average nanogroove separation with time is larger for nanogrooves created along a 100 azimuth compared to the 110 azimuth. The 100 ori...
Ion beam sputtering can induce the formation of regular self-assembled surface nanostructures on dif...
Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in...
We investigate the role of the initial structural condition in silicon surface nanopatterning by low...
Ion bombardment at extreme grazing incidence leads to the formation of remarkably well ordered, one ...
4 pages, 3 figures.-- PACS nrs.: 68.35.Ct, 05.45.-a, 79.20.Rf, 81.16.Rf.We report the experimental o...
Intricate topographical patterns can form on the surface of crystalline Ge(001) subject to low-energ...
The dynamical characteristics of surface nanopatterning using low-energy ion beams remains a central...
Morphological evolution of surfaces during the course of off-normal cluster ion beam bombardment is ...
Modification of nanoscale surface topography is inherent to low-energy ion beam erosion processes an...
Physical and chemical phenomena of low-energy ion irradiation on solid surfaces have been studied sy...
Instabilities caused during the erosion of a surface by an ion beam can lead to the formation of sel...
The off-normal ion irradiation of semiconductor materials is seen to induce nanopatterning effects. ...
The off-normal ion irradiation of semiconductor materials is seen to induce nanopatterning effects. ...
The proceeding at: 19th International Conference on Ion Beam Modification of Materials (IBMM 2014)...
Surface etching by ion sputtering can be used to pattern surfaces. Recent studies using the high-spa...
Ion beam sputtering can induce the formation of regular self-assembled surface nanostructures on dif...
Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in...
We investigate the role of the initial structural condition in silicon surface nanopatterning by low...
Ion bombardment at extreme grazing incidence leads to the formation of remarkably well ordered, one ...
4 pages, 3 figures.-- PACS nrs.: 68.35.Ct, 05.45.-a, 79.20.Rf, 81.16.Rf.We report the experimental o...
Intricate topographical patterns can form on the surface of crystalline Ge(001) subject to low-energ...
The dynamical characteristics of surface nanopatterning using low-energy ion beams remains a central...
Morphological evolution of surfaces during the course of off-normal cluster ion beam bombardment is ...
Modification of nanoscale surface topography is inherent to low-energy ion beam erosion processes an...
Physical and chemical phenomena of low-energy ion irradiation on solid surfaces have been studied sy...
Instabilities caused during the erosion of a surface by an ion beam can lead to the formation of sel...
The off-normal ion irradiation of semiconductor materials is seen to induce nanopatterning effects. ...
The off-normal ion irradiation of semiconductor materials is seen to induce nanopatterning effects. ...
The proceeding at: 19th International Conference on Ion Beam Modification of Materials (IBMM 2014)...
Surface etching by ion sputtering can be used to pattern surfaces. Recent studies using the high-spa...
Ion beam sputtering can induce the formation of regular self-assembled surface nanostructures on dif...
Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in...
We investigate the role of the initial structural condition in silicon surface nanopatterning by low...