Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography
- Prodan, L.G.
- Euser, T.G.
- van Wolferen, H.A.G.M.
- Bostan, C.G.
- de Ridder, R.M.
- Beigang, R.
- Boller, K.-J.
- Kuipers, L.
Publication date
May 2004
DOIAbstract
We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm
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