Reflow bonding of borosilicate glass tubes to silicon wafers is a technology which has significant potential for microfluidic applications. The borosilicate glass tubes are designed to be used as an interface and package for wafer-level microfluidic devices. The strength of the resulting package has been tested by pressurizing it to failure. Failure occurred in the glass and the silicon adjacent to the bond, rather than along the bond itself. The bond formed is hermetic. The only leakage when testing the hermeticity of these bonds over a period of 1 month was due to gas diffusion through the glass. An unintended aspect of the heat treatments used for the reflow bonding was surface crystallization of the glass arising from heterogeneous nucl...
In this paper, we introduce a new bonding technology for the assembly of micro- structured glass sub...
Polysilicon thick films have been found to be an irreplaceable option in various sensors and other m...
New investigations were carried out in order to characterise the anodic bonding behaviour of borosil...
The subject of the thesis was the use of borosilicate glass (Duran®) tubes as an interface to wafer-...
Capillary bonding of glass tubes to silicon wafers has been elaborated. After proper preparation, tu...
For many years, different methods for bonding glass borofloat substrates have been investigated1, in...
The characteristics and mechanisms of damage and failure in microfluidic joints consisting of Kovar ...
Develop an efficient, reliable fusion bonding recipe for the glass-glass structured devices with pat...
The article deals with a novel laboratory anodic bonding device. This device is used for MEMS creati...
The fusion bond strength of glass tubes with standard silicon wafers is presented. Experiments with ...
We report here on the results of experiments concerning particular bonding processes potentially use...
Wafer bonding is a key technology in the manufacturing of micro electro mechanical systems (MEMS). I...
Localized heating and bonding techniques have been developed for hermetic and vacuum packaging of ME...
Wafer bonding is a key technology in the manufacturing of microelectronic and micromechanical system...
We present a rapid and highly reliable glass (fused silica) microfluidic device fabrication process ...
In this paper, we introduce a new bonding technology for the assembly of micro- structured glass sub...
Polysilicon thick films have been found to be an irreplaceable option in various sensors and other m...
New investigations were carried out in order to characterise the anodic bonding behaviour of borosil...
The subject of the thesis was the use of borosilicate glass (Duran®) tubes as an interface to wafer-...
Capillary bonding of glass tubes to silicon wafers has been elaborated. After proper preparation, tu...
For many years, different methods for bonding glass borofloat substrates have been investigated1, in...
The characteristics and mechanisms of damage and failure in microfluidic joints consisting of Kovar ...
Develop an efficient, reliable fusion bonding recipe for the glass-glass structured devices with pat...
The article deals with a novel laboratory anodic bonding device. This device is used for MEMS creati...
The fusion bond strength of glass tubes with standard silicon wafers is presented. Experiments with ...
We report here on the results of experiments concerning particular bonding processes potentially use...
Wafer bonding is a key technology in the manufacturing of micro electro mechanical systems (MEMS). I...
Localized heating and bonding techniques have been developed for hermetic and vacuum packaging of ME...
Wafer bonding is a key technology in the manufacturing of microelectronic and micromechanical system...
We present a rapid and highly reliable glass (fused silica) microfluidic device fabrication process ...
In this paper, we introduce a new bonding technology for the assembly of micro- structured glass sub...
Polysilicon thick films have been found to be an irreplaceable option in various sensors and other m...
New investigations were carried out in order to characterise the anodic bonding behaviour of borosil...