Ru and ZrN are candidate capping layers for applications such as catalysis, electronics and optical coatings: Ru exhibits a low resistivity, high thermal stability, excellent oxidation resistance and good diffusion capabilities. ZrN is thermally stable, and is known for its good mechanical properties. Although the oxidation process has been studied for both materials, the surface and especially the sub-surface oxidation is not properly understood and well addressed. We use the sub-monolayer surface sensitivity of the low energy ion scattering (LEIS) technique for in-situ monitoring of surface oxidation and determination of the oxygen sticking probabilities. From the LEIS in-depth signal, sub-nanometer sub-surface oxidation can be determined...
Oxidized zirconium surfaces have been studied by X-ray photoelectron spectroscopy (XPS) and low-ene...
Low energy ion scattering (LEIS) was employed for the analysis of thin films of Mo, Ru, Hf, Al and t...
Thermal desorption spectroscopy, ultraviolet photoelectron spectroscopy, low energy electron diffrac...
Ru and ZrN are candidate capping layers for applications such as catalysis, electronics and optical ...
In this study, we combine low-energy ion scattering (LEIS) static and sputter depth profiles for cha...
This thesis focuses on the study of physical and chemical processes occurring during growth and ther...
Low-energy (0.1-10 keV) ion scattering (LEIS) is used for the determination of the atomic compositio...
For next generation Extreme UV photolithography, multilayer coatings may require protective capping ...
The work presented in this thesis aims to deepen the understanding of the interaction between oxygen...
Modern low energy ion scattering (LEIS) can provide new information on the atomic composition of bot...
ZrO2 thin films might be used as capping layers for protecting extreme ultraviolet (EUV) optics agai...
In vacuo high-sensitivity low energy ion scattering (HS-LEIS) has been used to investigate the initi...
Thin ruthenium films are used in several applications such as catalysis, electronics and optical coa...
AbstractAn improved methodology of the Zr specimen preparation was developed which allows fabricatio...
Interfaces in thin film/substrate systems play a central role in the performance of electronic devic...
Oxidized zirconium surfaces have been studied by X-ray photoelectron spectroscopy (XPS) and low-ene...
Low energy ion scattering (LEIS) was employed for the analysis of thin films of Mo, Ru, Hf, Al and t...
Thermal desorption spectroscopy, ultraviolet photoelectron spectroscopy, low energy electron diffrac...
Ru and ZrN are candidate capping layers for applications such as catalysis, electronics and optical ...
In this study, we combine low-energy ion scattering (LEIS) static and sputter depth profiles for cha...
This thesis focuses on the study of physical and chemical processes occurring during growth and ther...
Low-energy (0.1-10 keV) ion scattering (LEIS) is used for the determination of the atomic compositio...
For next generation Extreme UV photolithography, multilayer coatings may require protective capping ...
The work presented in this thesis aims to deepen the understanding of the interaction between oxygen...
Modern low energy ion scattering (LEIS) can provide new information on the atomic composition of bot...
ZrO2 thin films might be used as capping layers for protecting extreme ultraviolet (EUV) optics agai...
In vacuo high-sensitivity low energy ion scattering (HS-LEIS) has been used to investigate the initi...
Thin ruthenium films are used in several applications such as catalysis, electronics and optical coa...
AbstractAn improved methodology of the Zr specimen preparation was developed which allows fabricatio...
Interfaces in thin film/substrate systems play a central role in the performance of electronic devic...
Oxidized zirconium surfaces have been studied by X-ray photoelectron spectroscopy (XPS) and low-ene...
Low energy ion scattering (LEIS) was employed for the analysis of thin films of Mo, Ru, Hf, Al and t...
Thermal desorption spectroscopy, ultraviolet photoelectron spectroscopy, low energy electron diffrac...