In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMCs), is reported. CID does not necessarily lead to direct yield loss, but may also induce latent damage leading to reliability losses. The damage is caused by the build up of a voltage potential difference between the two plates of the capacitor. A simple logarithmic relation is discovered between the damage by this voltage potential and the ratio of the area of the exposed antennas connected to the plates of the MIMC. This function allows anticipation of damage in MIMCs with long interconnects
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
[[abstract]]The plasma process induced charging damage on high-k gate dielectrics deserves to be exp...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMC) is reported....
Acknowledgments to G. Groeseneken and G. Van den Bosch from IMEC for the valuable inputs. In this pa...
In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reporte...
In this paper, new complex-antenna charging test structures are designed with antennas connected to ...
In this paper, strategics to cope with plasma charging damage in design and layout phases are discus...
Abs/mct- In this paper, strategies to cope with plasma charging damage in design and layout phases a...
This work provides an innovative understanding of MIM capacitor degradation behavior under a wide ra...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
When maintaining quality of a metal-insulator-metal capacitor process, it is important to fully unde...
This paper treats processing sequence induced changes on PZT. Two kinds of metal-PZT-metal capacitor...
Metal-insulator-metal capacitor (MIMC) reliability and electrical properties are defined by the TDDB...
Silicon nitride (SiN) metal-insulator-metal capacitors (MIMCAPs) are components of most GaAs and GaN...
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
[[abstract]]The plasma process induced charging damage on high-k gate dielectrics deserves to be exp...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMC) is reported....
Acknowledgments to G. Groeseneken and G. Van den Bosch from IMEC for the valuable inputs. In this pa...
In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reporte...
In this paper, new complex-antenna charging test structures are designed with antennas connected to ...
In this paper, strategics to cope with plasma charging damage in design and layout phases are discus...
Abs/mct- In this paper, strategies to cope with plasma charging damage in design and layout phases a...
This work provides an innovative understanding of MIM capacitor degradation behavior under a wide ra...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
When maintaining quality of a metal-insulator-metal capacitor process, it is important to fully unde...
This paper treats processing sequence induced changes on PZT. Two kinds of metal-PZT-metal capacitor...
Metal-insulator-metal capacitor (MIMC) reliability and electrical properties are defined by the TDDB...
Silicon nitride (SiN) metal-insulator-metal capacitors (MIMCAPs) are components of most GaAs and GaN...
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
[[abstract]]The plasma process induced charging damage on high-k gate dielectrics deserves to be exp...