Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures
- Bostan, C.G.
- de Ridder, R.M.
- van Dorssen, I.
- van Wolferen, Hendricus A.G.M.
- Kuipers, L.
- van Hulst, N.F.
Publication date
April 2002
DOI Publisher
Institute of Electrical and Electronics Engineers (IEEE)Abstract
Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of hole
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