Add to ORKGReactively co-sputtered amorphous aluminum oxide layers with low loss (0.11 dB/cm at NIR wavelength) have been fabricated. Channel waveguides with steep, smooth side walls have been etched by a dry process
Recently, we have demonstrated internal net gain with a bandwidth of 80 nm (1500 - 1580 nm) and 1533...
Amorphous aluminium oxide is an excellent host material for rareearth ions. Its low loss and large r...
Within the EU STREP project "Photonic integrated devices in activated amorphous and crystalline oxid...
In this paper we will present the fabrication and properties of reactively co-sputtered Al2O3 layers...
In this paper we will present the fabrication and properties of reactively co-sputtered $AL_{2}O_{3}...
Reactively co-sputtered amorphous $Al_2O_3$ waveguide layers with low propagation losses have been d...
Reactively co-sputtered amorphous $Al_2O_3$ waveguide layers with low propagation losses have been d...
We developed an rf-based reactive co-sputtering process which resulted in uniform, reproducible depo...
Al2O3 and Y2O3 are both very promising host materials for active integrated optics applications such...
$Al_{2}O_{3}$ and $Y_{2}O_{3}$ are both very promising host materials for active integrated optics a...
Aluminum oxide planar waveguides with low loss (0.11 dB/cm at 1523 nm) are fabricated. Channel waveg...
Growth of reactively co-sputtered $Al_2O_3$ layers and micro-structuring using reactive ion etching ...
Reactive co-sputtering has been applied as a low-cost method for deposition of $Al_2O_3:Er^{3+}$ lay...
Etching of amorphous $Al_2O_3$ and polycrystalline $Y_2O_3$ films has been investigated using an ind...
A reliable and reproducible deposition process for the fabrication of $Al_2O_3$ waveguides with loss...
Recently, we have demonstrated internal net gain with a bandwidth of 80 nm (1500 - 1580 nm) and 1533...
Amorphous aluminium oxide is an excellent host material for rareearth ions. Its low loss and large r...
Within the EU STREP project "Photonic integrated devices in activated amorphous and crystalline oxid...
In this paper we will present the fabrication and properties of reactively co-sputtered Al2O3 layers...
In this paper we will present the fabrication and properties of reactively co-sputtered $AL_{2}O_{3}...
Reactively co-sputtered amorphous $Al_2O_3$ waveguide layers with low propagation losses have been d...
Reactively co-sputtered amorphous $Al_2O_3$ waveguide layers with low propagation losses have been d...
We developed an rf-based reactive co-sputtering process which resulted in uniform, reproducible depo...
Al2O3 and Y2O3 are both very promising host materials for active integrated optics applications such...
$Al_{2}O_{3}$ and $Y_{2}O_{3}$ are both very promising host materials for active integrated optics a...
Aluminum oxide planar waveguides with low loss (0.11 dB/cm at 1523 nm) are fabricated. Channel waveg...
Growth of reactively co-sputtered $Al_2O_3$ layers and micro-structuring using reactive ion etching ...
Reactive co-sputtering has been applied as a low-cost method for deposition of $Al_2O_3:Er^{3+}$ lay...
Etching of amorphous $Al_2O_3$ and polycrystalline $Y_2O_3$ films has been investigated using an ind...
A reliable and reproducible deposition process for the fabrication of $Al_2O_3$ waveguides with loss...
Recently, we have demonstrated internal net gain with a bandwidth of 80 nm (1500 - 1580 nm) and 1533...
Amorphous aluminium oxide is an excellent host material for rareearth ions. Its low loss and large r...
Within the EU STREP project "Photonic integrated devices in activated amorphous and crystalline oxid...