Gallium doped tin oxide (Ga doped SnO2) thin films have been coated on silica glass substrates at 400 °C by the spray pyrolysis technique. The relative various volumes of Ga precursor solution, 0.5, 1.0, 1.5 and 2.0 were mixed with Sn precursor solution. The structural, morphological and optical properties of Ga doped SnO2 thin films are investigated. SnO2 and Ga doped SnO2 films showed well defined structures and polycrystalline nature and they showed orthorhombic and monoclinic structures. The variations of the surface morphology were observed by SEM results. The elemental compositional analysis of the Ga doped SnO2 thin films were confirmed using EDAX analysis. The transmittance spectra of the Ga doped SnO2 films were measured and a vari...
In the present work, we investigated the effect of Zr doping (0-6 at%) on the structural, electrical...
Tin oxide films (SnO2) are prepared by the spray pyrolysis technique at different temperatures. The ...
Mg doped tin oxide transparent conducting thin films were deposited at a substrate temperature of 45...
Transparent polycrystalline tin oxide (SnO2) thin films were deposited on commercial microscope glas...
International audienceSnO2 thin films were deposited on glass substrates at 350 °C by spray pyrolysi...
Tin oxide (SnO 2) thin films were deposited on commercial microscope glass and UV fused silica subst...
International audienceGa2O3 is a wide band gap transparent conductive oxide (TCO) currently investig...
Highly transparent polycrystalline thin film of SnO2 (tin dioxide) was deposited using a simple and ...
Tin oxide thin films doped with fluorine have been prepared by spray pyrolysis from SnCl2 Precursor ...
Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. ...
Dielectric and optical dispersion properties of thin films of SnO2 deposited via spray pyrolysis wer...
Fluorine doped tin oxide (FTO) films were successfully prepared on glass and quartz substrate at a s...
Tin oxide thin films doped with fluorine, antimony and both have been prepared by spray pyrolysis fr...
In this work, tin dioxide (SnO2) thin films were prepared at various substrate temperatures (380–440...
There have been a number of studies on the fabrication of Sn-doped gallium oxide (Ga2O3:Sn) films wi...
In the present work, we investigated the effect of Zr doping (0-6 at%) on the structural, electrical...
Tin oxide films (SnO2) are prepared by the spray pyrolysis technique at different temperatures. The ...
Mg doped tin oxide transparent conducting thin films were deposited at a substrate temperature of 45...
Transparent polycrystalline tin oxide (SnO2) thin films were deposited on commercial microscope glas...
International audienceSnO2 thin films were deposited on glass substrates at 350 °C by spray pyrolysi...
Tin oxide (SnO 2) thin films were deposited on commercial microscope glass and UV fused silica subst...
International audienceGa2O3 is a wide band gap transparent conductive oxide (TCO) currently investig...
Highly transparent polycrystalline thin film of SnO2 (tin dioxide) was deposited using a simple and ...
Tin oxide thin films doped with fluorine have been prepared by spray pyrolysis from SnCl2 Precursor ...
Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. ...
Dielectric and optical dispersion properties of thin films of SnO2 deposited via spray pyrolysis wer...
Fluorine doped tin oxide (FTO) films were successfully prepared on glass and quartz substrate at a s...
Tin oxide thin films doped with fluorine, antimony and both have been prepared by spray pyrolysis fr...
In this work, tin dioxide (SnO2) thin films were prepared at various substrate temperatures (380–440...
There have been a number of studies on the fabrication of Sn-doped gallium oxide (Ga2O3:Sn) films wi...
In the present work, we investigated the effect of Zr doping (0-6 at%) on the structural, electrical...
Tin oxide films (SnO2) are prepared by the spray pyrolysis technique at different temperatures. The ...
Mg doped tin oxide transparent conducting thin films were deposited at a substrate temperature of 45...