AlInN layers implanted with europium and erbium ions are systematically studied and compared with similarly implanted GaN. Cathodoluminescence from four series of annealed samples shows that the Eu/Er emissions from AlInN are considerably broader than those from GaN, while the peak positions only change slightly. The rate of increase of cathodoluminescence intensity with annealing temperature, up to 1300 °C, is analyzed for all four series. For Eu the increase exceeds 10× in both hosts. Although some decomposition is observed for annealing at 1200 °C, well above the growth temperature, AlInN is shown to be a surprisingly robust host for rare earth ions
Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL)...
Partilhar documento na coleção da comunidade Laboratório Associado I3NSelf assembled molecular beam ...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...
AlInN layers implanted with europium and erbium ions are systematically studied and compared with si...
AlInN layers implanted with europium and erbium ions are systematically studied and compared with si...
Study of the luminescence of Rare Earth ions introduced into III-nitride semiconductor hosts produce...
Europium was implanted into GaN through a 10 nm thick epitaxially grown AlN layer that protects the ...
Europium was implanted into GaN through a 10 nm thick epitaxially grown AlN layer that protects the ...
Er ions are implanted into the GaN thick films grown by hydride vapor phase epitaxy. The implantatio...
In this paper, temperature-dependent cathodoluminescence (CL) spectra of Er-implanted GaN thin films...
AlN and GaN films were co-implanted with europium and praseodymium ions followed by thermal anneali...
Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL)...
The intensity of Eu-related luminescence from ion-implanted GaN with a 10 nm thick AlN cap, both gro...
The intensity of Eu-related luminescence from ion-implanted GaN with a 10 nm thick AlN cap, both gro...
GaN epilayers grown by MOCVD were implanted with Tm and Eu under different implantation conditions, ...
Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL)...
Partilhar documento na coleção da comunidade Laboratório Associado I3NSelf assembled molecular beam ...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...
AlInN layers implanted with europium and erbium ions are systematically studied and compared with si...
AlInN layers implanted with europium and erbium ions are systematically studied and compared with si...
Study of the luminescence of Rare Earth ions introduced into III-nitride semiconductor hosts produce...
Europium was implanted into GaN through a 10 nm thick epitaxially grown AlN layer that protects the ...
Europium was implanted into GaN through a 10 nm thick epitaxially grown AlN layer that protects the ...
Er ions are implanted into the GaN thick films grown by hydride vapor phase epitaxy. The implantatio...
In this paper, temperature-dependent cathodoluminescence (CL) spectra of Er-implanted GaN thin films...
AlN and GaN films were co-implanted with europium and praseodymium ions followed by thermal anneali...
Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL)...
The intensity of Eu-related luminescence from ion-implanted GaN with a 10 nm thick AlN cap, both gro...
The intensity of Eu-related luminescence from ion-implanted GaN with a 10 nm thick AlN cap, both gro...
GaN epilayers grown by MOCVD were implanted with Tm and Eu under different implantation conditions, ...
Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL)...
Partilhar documento na coleção da comunidade Laboratório Associado I3NSelf assembled molecular beam ...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...