Titanium films were deposited on quartz, glass, polyamide and PET substrates in a high vacuum system at room temperature and their electrical resistance monitored in vacuo as a function of thickness. These measurements indicate that a low electrical resistance layer is formed in a gas-solid reaction during the condensation of the initial layers of Ti on glass and quartz substrates. Layers begin to show relative low electrical resistance at around 21 nm for glass and 9nm for quartz. Samples deposited on polyamide and PET do not show this low resistance feature
The interface of titanium disilicides TiSi2 on silicon formed by electron gun evaporation of silicon...
An in situ method is described for studying the reactions between thin titanium films and SiO2 or Na...
Thin Pt/TiOx films have proven to be chemically sensitive to their gap environment. To better unders...
Titanium films were deposited on quartz, glass, polyamide and PET substrates in a high vacuum system...
The influence of the deposition rate of titanium thin films on their microscopic structure has been ...
Fig. 2. Ti(N) films are subjected to 35 min furnace anneals at 800~ in different gas ambients. Typic...
Thin films of titanium dioxide are deposited on gas-sensor substrates at 450?degrees C from the aero...
Electron beam evaporation (EB-PVD) and cathodic arc physical vapor deposition (CA-PVD) techniques we...
Thin films of titanium dioxide are deposited on gas-sensor substrates at 450 °C from the aerosol-ass...
We have developed a preparation technique to form graphite/TiO<sub>2</sub>/Ti and platinum–graphite/...
icro ed f ine) on pa he are used preferentially for active or passive thin film elements. capability...
WOS: 000276054200054In this paper we made a study on the effect of films thickness on the electrical...
Abstract: Problem statement: Ti films of the same thickness, deposition angle (near normal) and depo...
International audienceAiming at bio signal acquisition for bioelectrodes application,Ti–Ag thin film...
WOS: 0002937735000390.5 wt% Pd-doped titanium oxide thin films were obtained by dip-coating on silic...
The interface of titanium disilicides TiSi2 on silicon formed by electron gun evaporation of silicon...
An in situ method is described for studying the reactions between thin titanium films and SiO2 or Na...
Thin Pt/TiOx films have proven to be chemically sensitive to their gap environment. To better unders...
Titanium films were deposited on quartz, glass, polyamide and PET substrates in a high vacuum system...
The influence of the deposition rate of titanium thin films on their microscopic structure has been ...
Fig. 2. Ti(N) films are subjected to 35 min furnace anneals at 800~ in different gas ambients. Typic...
Thin films of titanium dioxide are deposited on gas-sensor substrates at 450?degrees C from the aero...
Electron beam evaporation (EB-PVD) and cathodic arc physical vapor deposition (CA-PVD) techniques we...
Thin films of titanium dioxide are deposited on gas-sensor substrates at 450 °C from the aerosol-ass...
We have developed a preparation technique to form graphite/TiO<sub>2</sub>/Ti and platinum–graphite/...
icro ed f ine) on pa he are used preferentially for active or passive thin film elements. capability...
WOS: 000276054200054In this paper we made a study on the effect of films thickness on the electrical...
Abstract: Problem statement: Ti films of the same thickness, deposition angle (near normal) and depo...
International audienceAiming at bio signal acquisition for bioelectrodes application,Ti–Ag thin film...
WOS: 0002937735000390.5 wt% Pd-doped titanium oxide thin films were obtained by dip-coating on silic...
The interface of titanium disilicides TiSi2 on silicon formed by electron gun evaporation of silicon...
An in situ method is described for studying the reactions between thin titanium films and SiO2 or Na...
Thin Pt/TiOx films have proven to be chemically sensitive to their gap environment. To better unders...