We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applications including mask-free photolithographic exposure. Devices with 64 /spl times/ 64 elements have been fabricated in matrix-addressed format, generating directed output powers of up to 1 /spl mu/W per 20-/spl mu/m-diameter element at less than 1.0-mA drive current. The resistance of each elemental device was found to depend strongly on the n-GaN stripe length. The center wavelength of the emission was measured to be 368 nm, which is very close to that of an i-line (365 nm) UV light source. To our knowledge, this is the first report detailing the fabrication and performance of such devices operating in the UV
The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing...
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the expo...
Micropixellated InGaN light-emitting diodes (micro- LEDs) have a wide number of potential applicatio...
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applicatio...
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applicatio...
The main task involved in the development of micro-LED arrays relates to the electrical contacting a...
We report the integration of a UV-curable polymer microlens array onto a matrix-addressable, 368-nm-...
The advances in fabrication technology bring arrays to the threshold of advanced research and commer...
High-performance InGaN light-emitting diodes consisting of 120 side-by-side and individually address...
The fabrication and performance of GaN-based micro-light emitting diode (g-LED) arrays with 64×64 el...
The fabrication and performance of GaN-based micro-light emitting diode (μ-LED) arrays with 64 × 64 ...
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the expo...
The fabrication and performance of GaN-based micro-light emitting diode (-LED) arrays with 64 × 64 e...
The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing...
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the expo...
Micropixellated InGaN light-emitting diodes (micro- LEDs) have a wide number of potential applicatio...
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applicatio...
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applicatio...
The main task involved in the development of micro-LED arrays relates to the electrical contacting a...
We report the integration of a UV-curable polymer microlens array onto a matrix-addressable, 368-nm-...
The advances in fabrication technology bring arrays to the threshold of advanced research and commer...
High-performance InGaN light-emitting diodes consisting of 120 side-by-side and individually address...
The fabrication and performance of GaN-based micro-light emitting diode (g-LED) arrays with 64×64 el...
The fabrication and performance of GaN-based micro-light emitting diode (μ-LED) arrays with 64 × 64 ...
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the expo...
The fabrication and performance of GaN-based micro-light emitting diode (-LED) arrays with 64 × 64 e...
The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing...
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the expo...
Micropixellated InGaN light-emitting diodes (micro- LEDs) have a wide number of potential applicatio...