Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretically at low primary ion energy. Evidence is found for a multiple collision process in which surface atoms are sputtered by backscattered ions. The introduction of the maximum recoil energy EM in the sputtering yield relation enabled us to describe sputtering when small energy transfers are involved
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Us...
Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretic...
The energy distributions of sputtered atoms and ions produced by few hundred to few thousand eV ion ...
Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been us...
Using molecular dynamics simulation, we have studied the low-energy sputtering at the energies near ...
A simple model is given for calculating the sputtering yield of single crystals as a function of the...
The sputtering effects of plasma-related ion-surface interactions have been investigated by measurin...
Abstract. Mass spectroscopic studies of the neutral particles puttered by Ar + ions at 8 keV from po...
The non-monotonous dependence of the total sputtering yield on the projectile atomic number, which i...
We describe a new tandem mass spectrometer which has been designed to investigate sputtering phenome...
The non-monotonous dependence of the total sputtering yield on the projectile atomic number, which i...
In the present work an effect of excitation of the metal electronic subsystem on the ionisation prob...
Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Us...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Us...
Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretic...
The energy distributions of sputtered atoms and ions produced by few hundred to few thousand eV ion ...
Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been us...
Using molecular dynamics simulation, we have studied the low-energy sputtering at the energies near ...
A simple model is given for calculating the sputtering yield of single crystals as a function of the...
The sputtering effects of plasma-related ion-surface interactions have been investigated by measurin...
Abstract. Mass spectroscopic studies of the neutral particles puttered by Ar + ions at 8 keV from po...
The non-monotonous dependence of the total sputtering yield on the projectile atomic number, which i...
We describe a new tandem mass spectrometer which has been designed to investigate sputtering phenome...
The non-monotonous dependence of the total sputtering yield on the projectile atomic number, which i...
In the present work an effect of excitation of the metal electronic subsystem on the ionisation prob...
Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Us...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Us...
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