Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes
- E. Louis
- F. Bijkerk
- Shmaenok, L.
- Voorma, H. J.
- van der Wiel, M. J.
- Schlatmann, R.
- Verhoeven, J.
- van der Drift, E. W. J. M.
- Romijn, J.
- Rousseeuw, B. A. C.
- Voss, F.
- Desor, R.
- Nikolaus, B.
Publication date
January 1993
DOI ISSN
0167-9317 Citation count (estimate)
9Abstract
In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources. fabrication of multilayer x-ray mirrors. and patterning of reflection masks. We are in the process of optimization of a laser-plasma x-ray source and measured the conversion-efficiency of laser light into x-rays. Furthermore we present results of etching patterns in x-ray reflection masks and we discuss improved deposition techniques to produce multilayer coatings with enhanced reflectivity
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