The kinetics and mechanism of the full reduction of a thin RuO2 film with a stoichiometric (110) surface on Ru(0001) by H2 has been studied in the temperature range of 100 to 400 C at 10-2 to 10 -4 Pa. The reduction kinetics is dominated by the creation of oxygen vacancies and their annihilation upon transformation of RuO2 into metallic Ru. The temperature-dependent reduction rate increases linearly with H2 pressure. In the temperature range of 100 up to 200 C, initially hydrogenation of the RuO2(110) surface occurs. Next, oxygen vacancies are created due to desorption of water vapor, which accelerates the reduction by place exchange of oxygen bulk atoms with an activation energy of 0.45 eV. In the temperature range of 200 to 300 C, slow re...
With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ...
The reduction of the surface oxide on Rh(111) by H-2 was observed in situ by scanning tunneling micr...
The surface reactions during the atomic layer deposition (ALD) of Ru using an organometallic precurs...
The kinetics and mechanism of the full reduction of a thin RuO<sub>2</sub> film with a stoichiometri...
With the aim of improving knowledge of the phenomena occurring during the development of thick-film ...
With the aim of improving knowledge of the phenomena occurring during the development of thick-film ...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
The kinetics and mechanism of O2 reduction on an Ru electrode in acid electrolytes have been measure...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The kinetics of oxygen reduction have been studied on a ruthenium electrode in alkaline solutions us...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The kinetics of ruthenium thin film deposition via the hydrogen assisted reduction of bis(2,2,6,6-te...
With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ...
The reduction of the surface oxide on Rh(111) by H-2 was observed in situ by scanning tunneling micr...
The surface reactions during the atomic layer deposition (ALD) of Ru using an organometallic precurs...
The kinetics and mechanism of the full reduction of a thin RuO<sub>2</sub> film with a stoichiometri...
With the aim of improving knowledge of the phenomena occurring during the development of thick-film ...
With the aim of improving knowledge of the phenomena occurring during the development of thick-film ...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
Employing temperature-programmed reaction and desorption, we studied the reduction of RuO2(110) by C...
The kinetics and mechanism of O2 reduction on an Ru electrode in acid electrolytes have been measure...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The kinetics of oxygen reduction have been studied on a ruthenium electrode in alkaline solutions us...
The interaction of hydrogen with RuO2(110) surfaces was studied by means of thermal desorption and v...
The kinetics of ruthenium thin film deposition via the hydrogen assisted reduction of bis(2,2,6,6-te...
With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ...
The reduction of the surface oxide on Rh(111) by H-2 was observed in situ by scanning tunneling micr...
The surface reactions during the atomic layer deposition (ALD) of Ru using an organometallic precurs...