The impact of process parameters on final bonding layer quality was investigated for Transient Liquid Phase (TLP) wafer-level bonding based on the Cu-Sn system. Subjects of this investigation were bonding temperature profile, bonding time and contact pressure as well as the choice of metal deposition method and the ratio of deposited metal layer thicknesses. Typical failure modes in Inter-Metallic Compound (IMC) growth for the mentioned process and design parameters were identified and subjected to qualitative and quantitative analysis. The possibilities to avoid abovementioned failures are indicated based on experimental results. © 2013 SPIE
In order to address the issue for the usage of electronic systems in harsh conditions such as high t...
| openaire: EC/H2020/826588/EU//APPLAUSEWafer-level solid liquid interdiffusion (SLID) bonding, also...
This paper presents the feasibility of highly reliable and repeatable copper-tin transient liquid ph...
Wafer-level Cu-Sn intermetallic bonding is an interesting process for advanced applications in the a...
This paper presents the development of a low temperature transient liquid phase bonding process for ...
Transient liquid phase (TLP) bonding of Cu substrates was conducted with interlayer systems with the...
Joining based on transient liquid phase bonding (TLPB) has a great prospect in microelectronic pac...
3D integration is an emerging technique which features vertical stacking of chips to achieve high pe...
Sn-coated Cu particles were prepared as a filler material for transient liquid phase (TLP) bonding. ...
A flux-less copper-tin (Cu-Sn) solid-liquid inter-diffusion (SLID) bonding process, providing a cost...
With growing demand in electronic system for operating in harsh conditions makes the idea of researc...
Transient liquid phase (TLP) soldering is one option for high temperature interconnects with the adv...
Electrodeposited copper (Cu)-tin (Sn) based solid-liquid interdiffusion (SLID) bonding is becoming p...
Wafer level hermetic encapsulation of MEMS is crucial from both commercial and scientific...
Developing solder joints capable of withstanding high power density, high temperature, and significa...
In order to address the issue for the usage of electronic systems in harsh conditions such as high t...
| openaire: EC/H2020/826588/EU//APPLAUSEWafer-level solid liquid interdiffusion (SLID) bonding, also...
This paper presents the feasibility of highly reliable and repeatable copper-tin transient liquid ph...
Wafer-level Cu-Sn intermetallic bonding is an interesting process for advanced applications in the a...
This paper presents the development of a low temperature transient liquid phase bonding process for ...
Transient liquid phase (TLP) bonding of Cu substrates was conducted with interlayer systems with the...
Joining based on transient liquid phase bonding (TLPB) has a great prospect in microelectronic pac...
3D integration is an emerging technique which features vertical stacking of chips to achieve high pe...
Sn-coated Cu particles were prepared as a filler material for transient liquid phase (TLP) bonding. ...
A flux-less copper-tin (Cu-Sn) solid-liquid inter-diffusion (SLID) bonding process, providing a cost...
With growing demand in electronic system for operating in harsh conditions makes the idea of researc...
Transient liquid phase (TLP) soldering is one option for high temperature interconnects with the adv...
Electrodeposited copper (Cu)-tin (Sn) based solid-liquid interdiffusion (SLID) bonding is becoming p...
Wafer level hermetic encapsulation of MEMS is crucial from both commercial and scientific...
Developing solder joints capable of withstanding high power density, high temperature, and significa...
In order to address the issue for the usage of electronic systems in harsh conditions such as high t...
| openaire: EC/H2020/826588/EU//APPLAUSEWafer-level solid liquid interdiffusion (SLID) bonding, also...
This paper presents the feasibility of highly reliable and repeatable copper-tin transient liquid ph...