Add to ORKGChemical deposition of silicon dioxide films by tetraethyl orthosilicate decomposition and doped silicon dioxide films as diffusion source
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
We have studied the deposition of silicon dioxide by thermal chemical vapor deposition from tetraeth...
International audienceAn apparent kinetic model for the chemical vapor deposition of SiO 2 from tetr...
A sputtering system was developed to deposit aluminum and aluminum alloys by the dc sputtering techn...
Silicon dioxide thin films were synthesized on silicon and quartz wafers using Ditertiarybutylsilane...
Thin films of electron beam evaporated silicon were deposited on molybdenum, tantalum, tungsten and ...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
This study focuses on producing thin and thick silicon dioxide films towards the fabrication of inte...
Diffusion of oxygen in thin films of silicon dioxide was studied using oxygen isotopically enriched ...
Ditertiarybutylsilane ( DTBS ) and oxygen have been used as precursors to produce silicon dioxide fi...
Deposition and evaluation of silicon films formed by pyrolytic decomposition of silane on oxidized s...
This study is focused on the synthesis and characterization of silicon dioxide thin films deposited ...
Layers of SiO2 with reproducible properties can be manufactured relatively easily today. In the case...
Amorphous silicon dioxide and aluminum oxide films are being considered by NASA for application on l...
Oxide barrier isolated regions of silicon single crystals in silicon dioxide matrix by epitaxial dep...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
We have studied the deposition of silicon dioxide by thermal chemical vapor deposition from tetraeth...
International audienceAn apparent kinetic model for the chemical vapor deposition of SiO 2 from tetr...
A sputtering system was developed to deposit aluminum and aluminum alloys by the dc sputtering techn...
Silicon dioxide thin films were synthesized on silicon and quartz wafers using Ditertiarybutylsilane...
Thin films of electron beam evaporated silicon were deposited on molybdenum, tantalum, tungsten and ...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
This study focuses on producing thin and thick silicon dioxide films towards the fabrication of inte...
Diffusion of oxygen in thin films of silicon dioxide was studied using oxygen isotopically enriched ...
Ditertiarybutylsilane ( DTBS ) and oxygen have been used as precursors to produce silicon dioxide fi...
Deposition and evaluation of silicon films formed by pyrolytic decomposition of silane on oxidized s...
This study is focused on the synthesis and characterization of silicon dioxide thin films deposited ...
Layers of SiO2 with reproducible properties can be manufactured relatively easily today. In the case...
Amorphous silicon dioxide and aluminum oxide films are being considered by NASA for application on l...
Oxide barrier isolated regions of silicon single crystals in silicon dioxide matrix by epitaxial dep...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
We have studied the deposition of silicon dioxide by thermal chemical vapor deposition from tetraeth...
International audienceAn apparent kinetic model for the chemical vapor deposition of SiO 2 from tetr...