Oksidasi Senyawa Organik Dengan Radiasi Uv Dan Hidrogen Peroksida : Toluen Dalam Larutan (Oxidation of Organic Compounds with Uv Radiation and Hydrogen Peroxide : Toluene in Aqueous Solutions)

Generally, waste water contains a large variety of organic and inorganic compounds. Most organic compounds are resistant to conventional chemical and biological treatments. Among them are aromatic compounds, such as toluene. This paper presents the results of experimental oxidation of toluene with combinations of UV and H2O2 which are usually called Advanced Oxidation Processes (AOPs). The experiments were performed in a batch system at room temperature. The experimental results exhibit that both initial concentration of hydrogen peroxide and initial pH affect the degree of oxidation. It is found that the order of reaction is pseudo first order with regard to toluene. The value of kapparent. is observed linearly with respect to the initial hydrogen peroxide concentration and exponentially with regard to the initial pH. The effect of the initial hydrogen peroxide concentrations on kapparent is expressed as kapparent = 0,0015 Cinitial + 0,0204 min-I and of the initial values of pH is kapparent = 0,0309 -0,027 (pH) min-I. The effect of Cinitial and pH on kapparent can be expressed as kapparent = (0,0374+ 0,0009 Cinitial) e -0,0316 (pH) min-1