This article reports on the analysis of energy flux density to the substrate and results of the detailed study of properties of Cr coatings deposited by magnetron sputtering with hot and cooled Cr targets. It was demonstrated that deposition rates of Cr films increase and particle flow density on the substrate changes by target sublimation. Heat radiation of the hot target leads to more rapid heating of the substrate and this energy flux has a main contribution in enhancement of total energy flux density on the substrate (from 0.06 to 0.43 W/cm2). As consequence, energy per deposited atom increases in 5.8 times for the hot Cr target sputtering even taking into account higher deposition rates. Cr films deposited by the cooled target sputteri...
[[abstract]]Cr–C–N coatings were deposited on a high-speed tool steel and Si wafer in Ar/N2/C2H2 pla...
Chrome plating is routinely being used in piston rings in the automobile industry. However, as the ...
A focus point in this work was the study of the influence of a low substrate temperature, as well as...
This article reports on the analysis of energy flux density to the substrate and results of the deta...
This study focuses on the deposition conditions, structural and mechanical properties of Cr films ob...
The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. Th...
Chromium films deposited by magnetron sputtering on non-heated substrates from non-thermalized atom...
This paper focuses on the influence of the High Power Pulsed Magnetron Sputtering (HPPMS) and Direct...
Appropriate conditions for depositing hard Cr2O3 coatings by reactive sputtering techniques have yet...
CrB2 thin films possess desirable combinations of properties (high hardness, wear resistance, chemic...
Chromium diboride thin films possess desirable combinations of properties (such as high hardness, we...
Abstract. Thin films of CrxOy were deposited on glass and stainless steel substrates at low temperat...
The most widely used surface treatment to protect engineering components is the deposition of hard c...
[[abstract]]Cr–C–N coatings were deposited on a high-speed tool steel and Si wafer in Ar/N2/C2H2 pla...
Chrome plating is routinely being used in piston rings in the automobile industry. However, as the ...
A focus point in this work was the study of the influence of a low substrate temperature, as well as...
This article reports on the analysis of energy flux density to the substrate and results of the deta...
This study focuses on the deposition conditions, structural and mechanical properties of Cr films ob...
The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. Th...
Chromium films deposited by magnetron sputtering on non-heated substrates from non-thermalized atom...
This paper focuses on the influence of the High Power Pulsed Magnetron Sputtering (HPPMS) and Direct...
Appropriate conditions for depositing hard Cr2O3 coatings by reactive sputtering techniques have yet...
CrB2 thin films possess desirable combinations of properties (high hardness, wear resistance, chemic...
Chromium diboride thin films possess desirable combinations of properties (such as high hardness, we...
Abstract. Thin films of CrxOy were deposited on glass and stainless steel substrates at low temperat...
The most widely used surface treatment to protect engineering components is the deposition of hard c...
[[abstract]]Cr–C–N coatings were deposited on a high-speed tool steel and Si wafer in Ar/N2/C2H2 pla...
Chrome plating is routinely being used in piston rings in the automobile industry. However, as the ...
A focus point in this work was the study of the influence of a low substrate temperature, as well as...