Enhanced Cu diffusion, Cu surface passivation, and surface smoothness at the bonding interface are the key requirements for high quality Copper-Copper (Cu-Cu) thermocompression bonding. In our previous work, we have demonstrated the usage of optimized Manganin metal alloy of 3 nm not only helps in passivating the Cu surface even at high temperature (<300°C) but also reduces the surface roughness to about 0.8 nm which substantially led to high quality Cu-Cu bonding. In this paper, we demonstrate an ultra-fine pitch Cu-Cu thermocompression bonding using an optimized ultra-thin damascene compatible Manganin metal alloy passivation. This engineering surface passivation approach has led to high quality bonding at sub 200° C temperature and a nom...
Advancement of the current Two-Dimensional integrated circuits (2D-ICs) is limited by increasing int...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, ...
Deposition of Ultra-thin Titanium (Ti) layer (3 nm) on Copper (Cu) surface inhibits surface oxidatio...
Enhanced Cu diffusion, Cu surface passivation, and surface smoothness at the bonding interface are t...
Damascene process compatible Copper (Cu) surface passivation, ultra-smooth surface and enhanced Cu d...
In this paper, we report a low temperature, fine-pitch, bump-less, damascene compatible Cu-Cu thermo...
Surface passivation plays a dual role of protecting copper (Cu) from getting oxidized and reducing t...
Surface passivation plays a dual role of protecting copper (Cu) from getting oxidized and reducing t...
In this paper, we report low temperature wafer level Cu-Cu thermo-compression bonding using an ultra...
Surface passivation of Copper plays vital role in accomplishing low temperature, low pressure Wafer-...
One of the primary and critical requirements for high quality wafer level thermocompression Copper-C...
In this paper, we investigate low temperature, low pressure and fine-pitch Copper-Copper thermo-comp...
In the present modern era of electronic industry has motivated for high performance integration by v...
Cu-to-Cu direct bonding plays an important role in three-dimensional integrated circuits (3D IC). Ho...
In this paper, we report the efficiency of Cu surface passivation by optimally chosen ultra-thin lay...
Advancement of the current Two-Dimensional integrated circuits (2D-ICs) is limited by increasing int...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, ...
Deposition of Ultra-thin Titanium (Ti) layer (3 nm) on Copper (Cu) surface inhibits surface oxidatio...
Enhanced Cu diffusion, Cu surface passivation, and surface smoothness at the bonding interface are t...
Damascene process compatible Copper (Cu) surface passivation, ultra-smooth surface and enhanced Cu d...
In this paper, we report a low temperature, fine-pitch, bump-less, damascene compatible Cu-Cu thermo...
Surface passivation plays a dual role of protecting copper (Cu) from getting oxidized and reducing t...
Surface passivation plays a dual role of protecting copper (Cu) from getting oxidized and reducing t...
In this paper, we report low temperature wafer level Cu-Cu thermo-compression bonding using an ultra...
Surface passivation of Copper plays vital role in accomplishing low temperature, low pressure Wafer-...
One of the primary and critical requirements for high quality wafer level thermocompression Copper-C...
In this paper, we investigate low temperature, low pressure and fine-pitch Copper-Copper thermo-comp...
In the present modern era of electronic industry has motivated for high performance integration by v...
Cu-to-Cu direct bonding plays an important role in three-dimensional integrated circuits (3D IC). Ho...
In this paper, we report the efficiency of Cu surface passivation by optimally chosen ultra-thin lay...
Advancement of the current Two-Dimensional integrated circuits (2D-ICs) is limited by increasing int...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, ...
Deposition of Ultra-thin Titanium (Ti) layer (3 nm) on Copper (Cu) surface inhibits surface oxidatio...