Scaling of the MOSFET face greater challenge by extreme power density due to leakage current in ultra deep sub-micron (UDSM) technology. To overcome from this situation double gate device like FinFET is used which has excellent control over the thin silicon fins with two electrically coupled gate, which mitigate shorter channel effect and exponentially reduces the leakage current. In this research paper utilize the property of FinFET in domino logic, for high speed operation and reduction of power consumption in wide fan-in OR gate. Proposed circuit is simulated in FinFET technology by BISM4 model using HSPICE at 32nm process technology at 250C with CL=1pF at 100MHz frequency. For 8 and 16 input OR gate we save average power 11.5%,11.39% in...
A variable threshold voltage keeper circuit technique using independent-gate FinFET technology is pr...
FINFET terminological in exactitude process reuses a massive part of well accustomed conventional CM...
This paper presents a simulation study on the gate length scaling of a double gate (DG) FinFET. To a...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
Scaling of single-gate MOSFET faces great challenges in the nanometer regime due to the severe short...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Scaling of single-gate bulk MOSFET faces great challenges in the nanometer regime due to the severe ...
AbstractFrom the commencement of CMOS scaling, the simple MOSFETs are not up to the performance due ...
Abstract-With the aggressive downscaling of the process technologies and importance of battery-power...
A variable threshold voltage keeper circuit technique using independent-gate FinFET technology is pr...
FINFET terminological in exactitude process reuses a massive part of well accustomed conventional CM...
This paper presents a simulation study on the gate length scaling of a double gate (DG) FinFET. To a...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
Scaling of single-gate MOSFET faces great challenges in the nanometer regime due to the severe short...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Scaling of single-gate bulk MOSFET faces great challenges in the nanometer regime due to the severe ...
AbstractFrom the commencement of CMOS scaling, the simple MOSFETs are not up to the performance due ...
Abstract-With the aggressive downscaling of the process technologies and importance of battery-power...
A variable threshold voltage keeper circuit technique using independent-gate FinFET technology is pr...
FINFET terminological in exactitude process reuses a massive part of well accustomed conventional CM...
This paper presents a simulation study on the gate length scaling of a double gate (DG) FinFET. To a...