Al2O3 alloyed with Cr is an important material for the tooling industry. It can be synthesized from an arc discharge using Al-Cr cathodes in an oxygen atmosphere. Due to formation of Al-rich oxide islands on the cathode surface, the arc process stability is highly sensitive to oxygen pressure. For improved stability, the use of Al0.70Cr0.25Si0.05 cathodes has previously been suggested, where Si may reduce island formation. Here, we have investigated the effect of Si by comparing plasma generation and thin film deposition from Al0.7Cr0.3 and Al0.7Cr0.25Si0.05 cathodes. Plasma ion composition, ion energies, ion charge states, neutral species, droplet formation, and film composition have been characterized at different O-2 flow rates for arc c...
Thin metal (e.g., Al, Cu, Ag) and metal oxide films (e.g., SiOx, AlyOx, SnyOx) were deposited on syn...
Plasma-assisted techniques have been widely used for deposition of high quality thin films and metal...
In the frame of this thesis, two similar high current DC arc (HCDCA) plasma sources were investigate...
Al2O3 alloyed with Cr is an important material for the tooling industry. It can be synthesized from ...
(Al,Cr)(2)O-3 coatings with Al/( Al + Cr) = 0.5 or Al = 70 at. %, doped with 0, 5, or 10 at. % Si, w...
DC arc plasma from Ti, Al, and Ti(1-x)A(l)x (x = 0.16, 0.25, 0.50, and 0.70) compound cathodes has b...
In this thesis the relationship between plasma chemistry and energetics and thin film properties was...
The effect of gas entry point on the plasma chemistry, ion energy distributions and resulting alumin...
Arc plasma from Ti-Si compound cathodes with up to 25 at. % Si was characterized in a DC arc system ...
Herein, we investigate the influence of powder metallurgical manufactured Ti0.5Al0.5 cathode grain s...
The pre-treatment of substrate surfaces prior to deposition is important for the adhesion of physica...
Oxide ceramic films can be made using a vacuum arc based technique in which a metal plasma is formed...
Thin metal and SiOx films were deposited on synthetic materials using a vacuum arc with a consumable...
AbstractThe energy distribution functions of ions in the cathodic arc plasma using composite AlCr ca...
Metal oxide thin films are of interest for a number of applications. Cathodic arc deposition, an est...
Thin metal (e.g., Al, Cu, Ag) and metal oxide films (e.g., SiOx, AlyOx, SnyOx) were deposited on syn...
Plasma-assisted techniques have been widely used for deposition of high quality thin films and metal...
In the frame of this thesis, two similar high current DC arc (HCDCA) plasma sources were investigate...
Al2O3 alloyed with Cr is an important material for the tooling industry. It can be synthesized from ...
(Al,Cr)(2)O-3 coatings with Al/( Al + Cr) = 0.5 or Al = 70 at. %, doped with 0, 5, or 10 at. % Si, w...
DC arc plasma from Ti, Al, and Ti(1-x)A(l)x (x = 0.16, 0.25, 0.50, and 0.70) compound cathodes has b...
In this thesis the relationship between plasma chemistry and energetics and thin film properties was...
The effect of gas entry point on the plasma chemistry, ion energy distributions and resulting alumin...
Arc plasma from Ti-Si compound cathodes with up to 25 at. % Si was characterized in a DC arc system ...
Herein, we investigate the influence of powder metallurgical manufactured Ti0.5Al0.5 cathode grain s...
The pre-treatment of substrate surfaces prior to deposition is important for the adhesion of physica...
Oxide ceramic films can be made using a vacuum arc based technique in which a metal plasma is formed...
Thin metal and SiOx films were deposited on synthetic materials using a vacuum arc with a consumable...
AbstractThe energy distribution functions of ions in the cathodic arc plasma using composite AlCr ca...
Metal oxide thin films are of interest for a number of applications. Cathodic arc deposition, an est...
Thin metal (e.g., Al, Cu, Ag) and metal oxide films (e.g., SiOx, AlyOx, SnyOx) were deposited on syn...
Plasma-assisted techniques have been widely used for deposition of high quality thin films and metal...
In the frame of this thesis, two similar high current DC arc (HCDCA) plasma sources were investigate...