Extended X-ray absorption fine structure measurements have been utilized to determine the structural parameters of InAs amorphised by ion implantation. Relative to crystalline standards, increases in bond length and Debye-Walter factor were apparent. Our results indicate that a total coordination number of four atoms, as observed in the crystalline phase, is retained in the amorphous material. Furthermore, homopolar bonding, forbidden in the crystalline phase, is present in the amorphous material and, apparently, in amorphous III-V semiconductors in general
We report on the rapid implantation-induced amorphization of the ternary Inx Ga1-x As alloys. Unlike...
The perturbed angular correlation technique has been utilized to understand the production and natur...
Structural parameters of InP amorphised by electronic energy deposition were determined using extend...
Extended X-ray absorption fine structure measurements have been utilized to determine the structural...
Extended X-ray absorption fine structure has been utilised to determine the structural parameters of...
Extended X-ray absorption fine structure has been utilised to determine the structural parameters of...
Extended X-ray absorption fine structure measurements have been used to characterize, at the atomic ...
Extended X-ray absorption fine structure (EXAFS) has been utilized to measure implantation-induced s...
Extended X-ray absorption fine structure measurements have been used to characterize, at the atomic ...
Two microscopic analytical techniques, extended X-ray absorption fine structure (EXAFS) and perturbe...
A detailed study of the atomic-scale structure of amorphous semiconductors utilizing Extended X-ray ...
Extended X-ray absorption fine structure (EXAFS) analysis has been used to determine the structural ...
Implantation-induced, microstructural modifications including increased bond length and non-Gaussian...
Extended X-ray absorption fine structure and Raman spectroscopy have been utilised to measure implan...
The local structure of amorphous Si (a-Si) formed by ion implantation has been investigated at the S...
We report on the rapid implantation-induced amorphization of the ternary Inx Ga1-x As alloys. Unlike...
The perturbed angular correlation technique has been utilized to understand the production and natur...
Structural parameters of InP amorphised by electronic energy deposition were determined using extend...
Extended X-ray absorption fine structure measurements have been utilized to determine the structural...
Extended X-ray absorption fine structure has been utilised to determine the structural parameters of...
Extended X-ray absorption fine structure has been utilised to determine the structural parameters of...
Extended X-ray absorption fine structure measurements have been used to characterize, at the atomic ...
Extended X-ray absorption fine structure (EXAFS) has been utilized to measure implantation-induced s...
Extended X-ray absorption fine structure measurements have been used to characterize, at the atomic ...
Two microscopic analytical techniques, extended X-ray absorption fine structure (EXAFS) and perturbe...
A detailed study of the atomic-scale structure of amorphous semiconductors utilizing Extended X-ray ...
Extended X-ray absorption fine structure (EXAFS) analysis has been used to determine the structural ...
Implantation-induced, microstructural modifications including increased bond length and non-Gaussian...
Extended X-ray absorption fine structure and Raman spectroscopy have been utilised to measure implan...
The local structure of amorphous Si (a-Si) formed by ion implantation has been investigated at the S...
We report on the rapid implantation-induced amorphization of the ternary Inx Ga1-x As alloys. Unlike...
The perturbed angular correlation technique has been utilized to understand the production and natur...
Structural parameters of InP amorphised by electronic energy deposition were determined using extend...