To apply the ballistic nature of hot electrons, an InP hot electron transistor with a buried metal (BM-HET) is reported. In this device, carriers are extracted from the emitter by an attractive potential originating from an embedded metal grating, and they propagate through intrinsic semiconductor material only. A simple estimation shows a high cutoff frequency and low output conductance. The estimated highest cutoff frequency is approximately 1 THz. Fabricated devices show that the collector current increased with the gate bias. After extraction of the leakage cur-rent, a clear saturation of the collector current in common-emitter characteristics was confirmed and the possibility of BM-HET as a candidate for high-speed electron devices was...
Hot electron in III–V FETs can be indirectly monitored by measuring the current coming out from the ...
InP-based HEMT technology presents substantial performance advantages for millimeter wave applicatio...
The purpose of this study is to investigate the capabilities of GaAs and InP Gunn devices at high fr...
In this letter, we report on the dc performance of chemical beam epitaxy grown InGaAs/InP hot electr...
Unipolar hot electron transistors (HETs) represent a tantalizing alternative to established bipolar ...
Combining two- and three-dimensional (2D/3D) materials provides a unique route to enabling next-gene...
III-Nitride based devices have made great progress over the past few decades in electronics and phot...
A superlattice base hot electron transistor is fabricated from molecular beam epitaxy (MBE) grown Al...
The prevalence of mobile computing devices and emerging demand for high data rate communication have...
InP-based quantum tunneling transistors were studied systematically using Chemical Beam Epitaxy (CBE...
The advance of crystal growth technology, specifically metalorganic chemical vapor deposition (MOCVD...
Recent advances using in situ focused ion beam implantation during an MBE growth interruption have b...
We demonstrate vertical graphene-base hot-electron transistors (GB-HETs) with a variety of structure...
A robust process technology using optical and electron beam lithography has been developed for 0.25 ...
The exceptional properties of the two-dimensional material, graphene, having high-mobility carriers,...
Hot electron in III–V FETs can be indirectly monitored by measuring the current coming out from the ...
InP-based HEMT technology presents substantial performance advantages for millimeter wave applicatio...
The purpose of this study is to investigate the capabilities of GaAs and InP Gunn devices at high fr...
In this letter, we report on the dc performance of chemical beam epitaxy grown InGaAs/InP hot electr...
Unipolar hot electron transistors (HETs) represent a tantalizing alternative to established bipolar ...
Combining two- and three-dimensional (2D/3D) materials provides a unique route to enabling next-gene...
III-Nitride based devices have made great progress over the past few decades in electronics and phot...
A superlattice base hot electron transistor is fabricated from molecular beam epitaxy (MBE) grown Al...
The prevalence of mobile computing devices and emerging demand for high data rate communication have...
InP-based quantum tunneling transistors were studied systematically using Chemical Beam Epitaxy (CBE...
The advance of crystal growth technology, specifically metalorganic chemical vapor deposition (MOCVD...
Recent advances using in situ focused ion beam implantation during an MBE growth interruption have b...
We demonstrate vertical graphene-base hot-electron transistors (GB-HETs) with a variety of structure...
A robust process technology using optical and electron beam lithography has been developed for 0.25 ...
The exceptional properties of the two-dimensional material, graphene, having high-mobility carriers,...
Hot electron in III–V FETs can be indirectly monitored by measuring the current coming out from the ...
InP-based HEMT technology presents substantial performance advantages for millimeter wave applicatio...
The purpose of this study is to investigate the capabilities of GaAs and InP Gunn devices at high fr...