Nanostructured deposition of nanoparticles from the gas phase

For many applications, nanoparticles from the gas phase are of interest due to their physical properties. Especially for electronic or optoelectronic applications, the transfer from their random distribution in the gas phase onto flat. substrate surfaces has to be controlled because the particles are needed in exactly defined areas on the substrate. We demonstrate a parallel process for the transfer of charge patterns on oxidized silicon surfaces followed by the deposition of mono-disperse singly charged nanoparticles, which allows the creation of particle arrangements reaching from 100 nm resolution up to structures in the upper micrometer range. The charge patterns are transferred using a polydimethylsiloxane (PDMS) stamp, which is covered with a metal layer. By applying different voltages to the stamp, negative or positive charges can be transferred. Thus, nanoparticles of different polarities can be guided to certain places