We report on In0.85Ga0.15As MOSFETs utilizing selectively grown lateral nanowires as the channel. These devices exhibit ON-current of ION = 565μ/Aμm at IOFF =100 nA/μm and VD=0.5 V, which is higher than all other reported values for III-V FETs. This is enabled by a transconductance of 2.9 mS/μm and a minimum SSsat of 77 mV/decade. A ballistic top-of-the-barrier model is used to model these devices and to predict their ultimate performance, which is approximately twice that of the fabricated devices
Lateral III-V nanowire (NW) MOSFETs are a promising candidate for high-frequency electronics. Howeve...
© 2013 IEEE. After 50 years of Moore's Law, Si CMOS, the mainstream logic technology, is on a course...
Vertical III-V nanowire MOSFETs are interesting candidates for future digital and analog application...
We report on In0.85Ga0.15As MOSFETs utilizing selectively grown lateral nanowires as the channel. Th...
We present compact modeling, DC and RF characterization of lateral and vertical nanowire MOSFETs. La...
Vertical InAs/InGaAs nanowire MOSFETs are fabricated in a gate-last fabrication process, which allow...
Vertical III-V nanowire MOSFETs have demonstrated excellent performance including high transconducta...
Furthering Si CMOS scaling requires development of high-mobility channel materials and advanced devi...
We demonstrate InGaAs tri-gate MOSFETs with an on-current of ION = 650 μA/μm at VDD = 0.5 V and IOFF...
We present vertical InAs nanowire MOSFETs on Si with an In0.7Ga0.3As drain. The devices show Ion and...
Recently, significant progress has been made in the understanding and improvement of high-k/III-V se...
In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown...
We demonstrate InGaAs multigate MOSFETs, so-called FinFETs. The lateral nanowires constituting the c...
We demonstrate a process to vary the gate-length of vertical MOSFETs on the same sample with high ac...
III-V MOSFETs provide improved electrostatic control at scaled gate lengths combined with a consider...
Lateral III-V nanowire (NW) MOSFETs are a promising candidate for high-frequency electronics. Howeve...
© 2013 IEEE. After 50 years of Moore's Law, Si CMOS, the mainstream logic technology, is on a course...
Vertical III-V nanowire MOSFETs are interesting candidates for future digital and analog application...
We report on In0.85Ga0.15As MOSFETs utilizing selectively grown lateral nanowires as the channel. Th...
We present compact modeling, DC and RF characterization of lateral and vertical nanowire MOSFETs. La...
Vertical InAs/InGaAs nanowire MOSFETs are fabricated in a gate-last fabrication process, which allow...
Vertical III-V nanowire MOSFETs have demonstrated excellent performance including high transconducta...
Furthering Si CMOS scaling requires development of high-mobility channel materials and advanced devi...
We demonstrate InGaAs tri-gate MOSFETs with an on-current of ION = 650 μA/μm at VDD = 0.5 V and IOFF...
We present vertical InAs nanowire MOSFETs on Si with an In0.7Ga0.3As drain. The devices show Ion and...
Recently, significant progress has been made in the understanding and improvement of high-k/III-V se...
In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown...
We demonstrate InGaAs multigate MOSFETs, so-called FinFETs. The lateral nanowires constituting the c...
We demonstrate a process to vary the gate-length of vertical MOSFETs on the same sample with high ac...
III-V MOSFETs provide improved electrostatic control at scaled gate lengths combined with a consider...
Lateral III-V nanowire (NW) MOSFETs are a promising candidate for high-frequency electronics. Howeve...
© 2013 IEEE. After 50 years of Moore's Law, Si CMOS, the mainstream logic technology, is on a course...
Vertical III-V nanowire MOSFETs are interesting candidates for future digital and analog application...