An A-center is an oxygen interstitial atom near a lattice vacancy and is one of the most common impurity-defect pairs in Czochralski-grown silicon crystals. In the present study, density functional theory calculations have been used to predict the binding energies of A-centers that are at nearest neighbor (NN) and next NN sites to isovalent impurities (carbon, germanium, and tin) in silicon. Interestingly, we predict that the A-center is more bound in isovalent-doped and, in particular, tin-doped silicon. We calculate that most of the binding energy of these A-centers originates from the interaction between the isovalent atoms and the vacancies
The bonding properties of tilt boundary in poly-silicon and the effect of interstitial impurities ar...
Results for supercell-size convergence of formation energies and charge transition levels of vacancy...
Si remains one of the most significant materials for industrial use—it is utilized in a wide variety...
In the present study density functional theory calculations have been used to calculate the binding ...
In the present study density functional theory calculations have been used to calculate the binding ...
Silicon is the mainstream material for many nanoelectronic and photovoltaic applications. The unders...
The study of defect centers in silicon has been recently reinvigorated by their potential applicatio...
We investigate the impact of tin doping on the formation of vacancy-oxygen pairs ( VO or A-centers) ...
Formation energies for oxygen and aluminum defects in hexagonal silicon nitride (beta-Si3N4) were ca...
The electronic structures of the dilute transition metal (TM) impurities, V2+, Cr+, Mn2+, and Mn0 in...
The T center in silicon is a well-known carbon-based color center that has been recently considered ...
Grain boundaries (GBs) are defects originating in multi-crystalline silicon during crystal growth fo...
Nitrogen is an important impurity in Czochralski grown silicon (Cz-Si) as it enhances oxygen precipi...
Atomistic simulation of a vacancy-assisted dopant diffusion in silicon needs details of the dopant-v...
Defects in crystalline silicon consisting of a silicon self-interstitial atom and one, two, three, o...
The bonding properties of tilt boundary in poly-silicon and the effect of interstitial impurities ar...
Results for supercell-size convergence of formation energies and charge transition levels of vacancy...
Si remains one of the most significant materials for industrial use—it is utilized in a wide variety...
In the present study density functional theory calculations have been used to calculate the binding ...
In the present study density functional theory calculations have been used to calculate the binding ...
Silicon is the mainstream material for many nanoelectronic and photovoltaic applications. The unders...
The study of defect centers in silicon has been recently reinvigorated by their potential applicatio...
We investigate the impact of tin doping on the formation of vacancy-oxygen pairs ( VO or A-centers) ...
Formation energies for oxygen and aluminum defects in hexagonal silicon nitride (beta-Si3N4) were ca...
The electronic structures of the dilute transition metal (TM) impurities, V2+, Cr+, Mn2+, and Mn0 in...
The T center in silicon is a well-known carbon-based color center that has been recently considered ...
Grain boundaries (GBs) are defects originating in multi-crystalline silicon during crystal growth fo...
Nitrogen is an important impurity in Czochralski grown silicon (Cz-Si) as it enhances oxygen precipi...
Atomistic simulation of a vacancy-assisted dopant diffusion in silicon needs details of the dopant-v...
Defects in crystalline silicon consisting of a silicon self-interstitial atom and one, two, three, o...
The bonding properties of tilt boundary in poly-silicon and the effect of interstitial impurities ar...
Results for supercell-size convergence of formation energies and charge transition levels of vacancy...
Si remains one of the most significant materials for industrial use—it is utilized in a wide variety...