Structural and mechanical evolution of reactively and non-reactively sputtered Zr–Al–N thin films during annealing

AbstractThe influence of reactive and non-reactive sputtering on structure, mechanical properties, and thermal stability of Zr1−xAlxN thin films during annealing to 1500°C is investigated in detail. Reactive sputtering of a Zr0.6Al0.4 target leads to the formation of Zr0.66Al0.34N thin films, mainly composed of supersaturated cubic (c) Zr1−xAlxN with small fractions of (semi-)coherent wurtzite (w) AlN domains. Upon annealing, the formation of cubic Zr-rich domains and growth of the (semi-)coherent w-AlN domains indicate spinodal-like decomposition. Loss of coherency can only be observed for annealing temperatures above 1150°C. Following these decomposition processes, the hardness remains at the as-deposited value of ~29GPa with annealing up to 1100°C. Using a ceramic (ZrN)0.6(AlN)0.4 target and sputtering in Ar atmosphere allows preparing c-Zr0.68Al0.32N coatings with a well-defined crystalline single-phase cubic structure combined with higher hardnesses of ~31GPa. Due to the absence of (semi-)coherent w-AlN domains in the as-deposited state, which could act as nucleation sites, the decomposition process of c-Zr1−xAlxN is retarded. Only after annealing at 1270°C, the formation of incoherent w-AlN can be detected. Hence, their hardness remains very high with ~33GPa even after annealing at 1200°C. The study highlights the importance of controlling the deposition process to prepare well-defined coatings with high mechanical properties and thermal stability