AbstractIn this paper, a CMOS condenser microphone with high sensitivity and low polarization voltage was designed, simulated and fabricated. Due to CMOS process temperature variant and lattice defects, the poly-membrane would be invoked normal stress and gradient stress. These two residual stresses would deform the membrane and increase the membrane's rigidity. For these concerns, an interlace slots design is utilized to reduce the normal stress up to 90%, and the annealing process is applied to decrease the gradient stress. The acoustical sensitivity was increased considerably to -45dBV at 2.7V bias voltage, and, the noise level is -85dBV at 1KHz
MEMS piezoresistive sound detectors have been fabricated using the dissolved wafer process for the f...
The sensitivity of a silicon condenser microphone, which essentially consists of a rigid backplate ...
A condenser microphone design that can be fabricated using the sacrificial layer technique is propos...
AbstractIn this paper, a CMOS condenser microphone with high sensitivity and low polarization voltag...
This study reports a CMOS-MEMS condenser microphone implemented using the standard thin film stackin...
A novel fabrication process, which uses wafer transfer and micro-electroplating technique, has been ...
In this paper the development of a capacitive microphone with integrated preamplifier is described. ...
Microphones are ordinary pressure sensors with an optimum behavior in a certain pressure and frequen...
In this project, a novel diaphragm-backplate structure for silicon condenser microphone is proposed....
A capacitive single-chip silicon microphone with very low-stress polysilicon membrane was fabricated...
Capacitive microphones (condenser microphones) work on a principle of variable capacitance and volta...
A new condenser microphone with a 300 nm thick monocrystalline silicon and silicon nitride sandwich ...
Several models concerning the sensitivity of capacitive pressure sensors have been presented in the ...
ISBN 978-2-35500-013-3International audienceThis paper presents a standard complementary metal- oxid...
A miniature silicon condenser microphone with a reinforced piston type diaphragm has been developed....
MEMS piezoresistive sound detectors have been fabricated using the dissolved wafer process for the f...
The sensitivity of a silicon condenser microphone, which essentially consists of a rigid backplate ...
A condenser microphone design that can be fabricated using the sacrificial layer technique is propos...
AbstractIn this paper, a CMOS condenser microphone with high sensitivity and low polarization voltag...
This study reports a CMOS-MEMS condenser microphone implemented using the standard thin film stackin...
A novel fabrication process, which uses wafer transfer and micro-electroplating technique, has been ...
In this paper the development of a capacitive microphone with integrated preamplifier is described. ...
Microphones are ordinary pressure sensors with an optimum behavior in a certain pressure and frequen...
In this project, a novel diaphragm-backplate structure for silicon condenser microphone is proposed....
A capacitive single-chip silicon microphone with very low-stress polysilicon membrane was fabricated...
Capacitive microphones (condenser microphones) work on a principle of variable capacitance and volta...
A new condenser microphone with a 300 nm thick monocrystalline silicon and silicon nitride sandwich ...
Several models concerning the sensitivity of capacitive pressure sensors have been presented in the ...
ISBN 978-2-35500-013-3International audienceThis paper presents a standard complementary metal- oxid...
A miniature silicon condenser microphone with a reinforced piston type diaphragm has been developed....
MEMS piezoresistive sound detectors have been fabricated using the dissolved wafer process for the f...
The sensitivity of a silicon condenser microphone, which essentially consists of a rigid backplate ...
A condenser microphone design that can be fabricated using the sacrificial layer technique is propos...