AbstractRF excited capacitive coupled hollow cathode (CCHC) plasma source was developed for the fabrication of super smooth optics. The frequency of the RF power was 100MHz, and the maximum power output was 150W. Optical emission spectroscopy (OES) was used to diagnose the argon plasma generated in the plasma polishing apparatus. Bispectral analysis was used to calculate the argon plasma temperature and electron density. The result shows that when the RF power changed from 40W to 120W the plasma temperature was between 1989K and 2200K. The electron density increased with the increment of the RF power
We present a combined experimental and numerical investigation of the plasma properties in an asymme...
This work describes the experimental set up used for carrying out spectroscopic measurements in a pl...
A planar probe and optical emission spectroscopy were employed to analyze parameters in an inductive...
AbstractRF excited capacitive coupled hollow cathode (CCHC) plasma source was developed for the fabr...
AbstractA novel plasma polishing process has been developed. In the process, highly stable SF6 and A...
AbstractThe use of plasma for super smooth surface polishing is well established in the microelectro...
AbstractA novel capacitive coupled hollow cathode (CCHC) RF vacuum discharge polishing apparatus was...
The parallel plate capacitively coupled plasma (PP-CCP) is a fairly new and unique source for spectr...
This work presents the design, development and experimental results obtained from an RF plasma cath...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Recent technological achievements in the area of semiconductor technology have been the reason for t...
A unique plasma figuring (PF) process was created and demonstrated at Cranfield University for manuf...
Plasma figuring process enables the correction of metre-scale optical surfaces, which has advantages...
The plasma contactor performance is outlined. Some performance objectives are given including expell...
We have developed several diagnostic techniques to characterize two types of microwave (MW) discharg...
We present a combined experimental and numerical investigation of the plasma properties in an asymme...
This work describes the experimental set up used for carrying out spectroscopic measurements in a pl...
A planar probe and optical emission spectroscopy were employed to analyze parameters in an inductive...
AbstractRF excited capacitive coupled hollow cathode (CCHC) plasma source was developed for the fabr...
AbstractA novel plasma polishing process has been developed. In the process, highly stable SF6 and A...
AbstractThe use of plasma for super smooth surface polishing is well established in the microelectro...
AbstractA novel capacitive coupled hollow cathode (CCHC) RF vacuum discharge polishing apparatus was...
The parallel plate capacitively coupled plasma (PP-CCP) is a fairly new and unique source for spectr...
This work presents the design, development and experimental results obtained from an RF plasma cath...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Recent technological achievements in the area of semiconductor technology have been the reason for t...
A unique plasma figuring (PF) process was created and demonstrated at Cranfield University for manuf...
Plasma figuring process enables the correction of metre-scale optical surfaces, which has advantages...
The plasma contactor performance is outlined. Some performance objectives are given including expell...
We have developed several diagnostic techniques to characterize two types of microwave (MW) discharg...
We present a combined experimental and numerical investigation of the plasma properties in an asymme...
This work describes the experimental set up used for carrying out spectroscopic measurements in a pl...
A planar probe and optical emission spectroscopy were employed to analyze parameters in an inductive...