The Applications of Plasma Immersion Ion Implantation to Crystalline Silicon Solar Cells

AbstractIn the paper, plasma immersion ion implantation (PIII) has been put forward to texture and dope the silicon for solar cells. The influence of PIII parameters on the surface structure has been investigated. The various surface structure of the silicon can be obtained by PIII texturing. Compared with acid texturing solar cells, the average conversion efficiency of PIII texturing solar cells has been improved by 0.7% absolute gain. The characteristics of PN junction formed by PIII doping have been investigated. The conversion efficiency of the solar cell can reach as high as 14.84% using PIII doping