By means of relativistic density functional theory (DFT) calculations we study electron band structure of the topological insulator (TI) Bi2Se3 thin films deposited on the ferromagnetic insulator (FMI) EuS substrate. In the Bi2Se3/EuS heterostructure, the gap opened in the spectrum of the topological state has a hybridization character and is shown to be controlled by the Bi2Se3 film thickness, while magnetic contribution to the gap is negligibly small. We also analyzed the effect of Eu doping on the magnetization of the Bi2Se3 film and demonstrated that the Eu impurity induces magnetic moments on neighboring Se and Bi atoms an order of magnitude larger than the substrate-induced moments. Recent magnetic and magneto-transport measurements i...
Topological insulators (TIs) are recently predicted, and much studied, new quantum materials. These ...
Topological insulators (TIs) like Bi2Se3 are a class of material with topologically protected surfac...
This article belongs to the Special Issue Advances in Topological Materials: Fundamentals, Challenge...
Heterostructures made from topological and magnetic insulators promise to form excellent platforms f...
Magnetic proximity effect at the interface between magnetic and topological insulators (MIs and TIs)...
Heterostructures of topological insulators and ferromagnets offer new opportunities in spintronics a...
We present a first-principles study of electronic properties of ultrathin films of topological insul...
Resumen del póster presentado al 1st Workshop Spain-Taiwan: "2D Materials and Interfaces for Spintro...
This dissertation seeks to deepen our understanding of the novel physical properties in a class of t...
An exchange gap in the Dirac surface states of a topological insulator (TI) is necessary for observi...
We report transport studies on the 5 nm thick Bi2Se3 topological insulator films which are grown via...
This letter presents the first-principles study of a three-dimensional (3D) topological insulator (T...
The tailoring, of topological surface states in topological insulators is essential for device appli...
We study the effect of Fe impurities deposited on the surface of the topological insulator Bi2Se3 by...
The recently discovered time-reversal-invariant topological insulator (TI) has led to the flourishin...
Topological insulators (TIs) are recently predicted, and much studied, new quantum materials. These ...
Topological insulators (TIs) like Bi2Se3 are a class of material with topologically protected surfac...
This article belongs to the Special Issue Advances in Topological Materials: Fundamentals, Challenge...
Heterostructures made from topological and magnetic insulators promise to form excellent platforms f...
Magnetic proximity effect at the interface between magnetic and topological insulators (MIs and TIs)...
Heterostructures of topological insulators and ferromagnets offer new opportunities in spintronics a...
We present a first-principles study of electronic properties of ultrathin films of topological insul...
Resumen del póster presentado al 1st Workshop Spain-Taiwan: "2D Materials and Interfaces for Spintro...
This dissertation seeks to deepen our understanding of the novel physical properties in a class of t...
An exchange gap in the Dirac surface states of a topological insulator (TI) is necessary for observi...
We report transport studies on the 5 nm thick Bi2Se3 topological insulator films which are grown via...
This letter presents the first-principles study of a three-dimensional (3D) topological insulator (T...
The tailoring, of topological surface states in topological insulators is essential for device appli...
We study the effect of Fe impurities deposited on the surface of the topological insulator Bi2Se3 by...
The recently discovered time-reversal-invariant topological insulator (TI) has led to the flourishin...
Topological insulators (TIs) are recently predicted, and much studied, new quantum materials. These ...
Topological insulators (TIs) like Bi2Se3 are a class of material with topologically protected surfac...
This article belongs to the Special Issue Advances in Topological Materials: Fundamentals, Challenge...