A theory of charged-dislocation-line scattering is developed within the framework of the Boltzmann transport equation. A fit of the theory to temperature-dependent Hall-effect data in GaN gives dislocation densities which are in excellent agreement with those measured by transmission electron microscopy. This work shows that threading edge dislocations in GaN indeed are electrically active, in agreement with recent theoretical predictions
Lattice-mismatched epitaxy produces a high concentration of dislocations (N-dis) in the interface re...
Cathodoluminescence technique combined with transmission electron microscopy (TEM-CL) has been used ...
We have performed Monte Carlo calculations to determine the charge accumulation on threading edge di...
A theory of charged-dislocation-line scattering is developed within the framework of the Boltzmann t...
The scattering of carriers due to dislocations is studied. Unlike semiconductors such as Si or GaAs,...
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron ga...
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron ga...
Abstract. The electron mobility of GaN has been obtained at various temperatures by the relaxation t...
This paper presents the calculation of electron mobility of GaN at various temperatures using Relaxa...
We present a study of electron scattering processes in AlGaN/GaN two-dimensional electron gases. A t...
Dislocation lines affect the electrical and optical properties of semiconductors. In this research,...
We investigated the type, spatial distribution, line direction, and electronic properties of disloca...
The atomic structures, electrical properties, and line energies for threading screw and threading ed...
The magneto-transport measurements, carried out at magnetic fields up to 11 T and in the temperature...
High temperature transport characteristics of unintentionally doped GaN have been investigated by me...
Lattice-mismatched epitaxy produces a high concentration of dislocations (N-dis) in the interface re...
Cathodoluminescence technique combined with transmission electron microscopy (TEM-CL) has been used ...
We have performed Monte Carlo calculations to determine the charge accumulation on threading edge di...
A theory of charged-dislocation-line scattering is developed within the framework of the Boltzmann t...
The scattering of carriers due to dislocations is studied. Unlike semiconductors such as Si or GaAs,...
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron ga...
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron ga...
Abstract. The electron mobility of GaN has been obtained at various temperatures by the relaxation t...
This paper presents the calculation of electron mobility of GaN at various temperatures using Relaxa...
We present a study of electron scattering processes in AlGaN/GaN two-dimensional electron gases. A t...
Dislocation lines affect the electrical and optical properties of semiconductors. In this research,...
We investigated the type, spatial distribution, line direction, and electronic properties of disloca...
The atomic structures, electrical properties, and line energies for threading screw and threading ed...
The magneto-transport measurements, carried out at magnetic fields up to 11 T and in the temperature...
High temperature transport characteristics of unintentionally doped GaN have been investigated by me...
Lattice-mismatched epitaxy produces a high concentration of dislocations (N-dis) in the interface re...
Cathodoluminescence technique combined with transmission electron microscopy (TEM-CL) has been used ...
We have performed Monte Carlo calculations to determine the charge accumulation on threading edge di...