The proceedings of a conference on sputtering and ion plating are presented. Subjects discussed are: (1) concepts and applications of ion plating, (2) sputtering for deposition of solid film lubricants, (3) commercial ion plating equipment, (4) industrial potential for ion plating and sputtering, and (5) fundamentals of RF and DC sputtering
Ion beam sputter processing rates as well as pertinent characteristics of etched targets and films a...
The sputtering process is described in terms of its features: versatility, momentum transfer, config...
Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a ...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
The sputtering and ion plating technology is reviewed in terms of their potential, uses and performa...
The ion plating techniques are classified relative to the instrumental set up, evaporation media, an...
Hundreds of research papers on various elements of sputtering have been published. The goal of this ...
The glow discharge or ion assisted vacuum deposition techniques, primarily sputtering and ion platin...
Results of experiments to study ion beam sputter polishing in conjunction with simultaneous depositi...
Ion plating deposits thin film on complex surface in one operation. The ionized materials follow ele...
Under ideal conditions ion plating produces finely grained dense coatings with excellent adhesion. T...
The potential of using the sputtering process as a deposition technique is reviewed; however, the ma...
Ion plating method for thin gold film deposition on complex surface configuration
An analytical model was developed to describe the development of a coned surface texture with ion bo...
The ion-assisted or plasma coating technology is discussed as it applies to the deposition of hard, ...
Ion beam sputter processing rates as well as pertinent characteristics of etched targets and films a...
The sputtering process is described in terms of its features: versatility, momentum transfer, config...
Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a ...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
The sputtering and ion plating technology is reviewed in terms of their potential, uses and performa...
The ion plating techniques are classified relative to the instrumental set up, evaporation media, an...
Hundreds of research papers on various elements of sputtering have been published. The goal of this ...
The glow discharge or ion assisted vacuum deposition techniques, primarily sputtering and ion platin...
Results of experiments to study ion beam sputter polishing in conjunction with simultaneous depositi...
Ion plating deposits thin film on complex surface in one operation. The ionized materials follow ele...
Under ideal conditions ion plating produces finely grained dense coatings with excellent adhesion. T...
The potential of using the sputtering process as a deposition technique is reviewed; however, the ma...
Ion plating method for thin gold film deposition on complex surface configuration
An analytical model was developed to describe the development of a coned surface texture with ion bo...
The ion-assisted or plasma coating technology is discussed as it applies to the deposition of hard, ...
Ion beam sputter processing rates as well as pertinent characteristics of etched targets and films a...
The sputtering process is described in terms of its features: versatility, momentum transfer, config...
Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a ...