International audienceUsing a new extraction methodology taking into account multisubband population and carrier degeneracy, we have experimentally determined backscattering coefficients, ballistic ratios, and injection velocities of n- and p-FDSOI devices with gate lengths down to 30 nm in the saturated and, for the first time, in the linear regimes. The evolution of these quasi-ballistic parameters is examined as a function of the inversion charge in the channel and at temperatures ranging from 50 to 293 K, showing stronger ballistic ratios in the saturated regime than in the linear one. We particularly focus on the linear regime, and a model linking ballisticity ratios and effective mobility is proposed and validated experimentally for d...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
IEEE Silicon Nanoelectronics Workshop (SNW 2008), Honolulu, HI, JUN 15-16, 2008International audienc...
International audienceA new fully experimental method to determine the backscattering coefficient an...
International audienceA new fully experimental method to determine the backscattering coefficient an...
International audienceA new fully experimental method to determine the backscattering coefficient an...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
International audienceDue to a new quasi-ballistic extraction methodology dedicated to low-longitudi...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
For many years the transistor dimensions were reduced at each technology generation to increase the ...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
International audienceWe developed an original physics-based unified analytical model describing the...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
IEEE Silicon Nanoelectronics Workshop (SNW 2008), Honolulu, HI, JUN 15-16, 2008International audienc...
International audienceA new fully experimental method to determine the backscattering coefficient an...
International audienceA new fully experimental method to determine the backscattering coefficient an...
International audienceA new fully experimental method to determine the backscattering coefficient an...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
7th International Conference on Ultimate Integration on Silicon, Grenoble, FRANCE, APR 20-21, 2006In...
International audienceDue to a new quasi-ballistic extraction methodology dedicated to low-longitudi...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
For many years the transistor dimensions were reduced at each technology generation to increase the ...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
In this work, Monte Carlo simulations and analytical modeling are used to investigate quasi-ballisti...
International audienceWe developed an original physics-based unified analytical model describing the...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
International audienceThis letter presents a new analytical model of the backscattering coefficient ...
IEEE Silicon Nanoelectronics Workshop (SNW 2008), Honolulu, HI, JUN 15-16, 2008International audienc...