iv Dowquently irradiated with hard X-rays from a synchrotron source. A mask is used to direct a pattern of X-radiation onto the PMMA sur-face. As a result of the incident ionizing radiation, the PMMA under-goes chain scission reactions that result in a substantial decrease in the polymer molecular mass, as well as formation of a variety of gaseous small molecules (CO2, CH4, CH3OH, etc.).5 The reduction in molecular mass of the PMMA in the exposed areas leads to its ready dissolution in certain developing solvents,1 which in turn leads to a microstructured PMMA template supported on the conducting sub-strate. Metals can then be deposited into the polymer template using standard electroplating methods. Removal of the PMMA template results in ...
Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are gr...
The chemically selective modification of polymer mixtures by monochromated soft X-rays has been expl...
<p>Spin-coating of PMGI and PMMA on a clean silicon wafer (a) is followed by exposure of the sample ...
During the last decade there has been a rapid development in Micro-Fabrication Technology driven by ...
We describe here initial studies of several commercially available poly(methylmethacrylate)s, PMMAs,...
In the present study, a modified deep X-ray lithography process is utilized for an efficient fabrica...
This thesis describes work performed on a novel form of surface-micromachining, called self-sacrific...
The availability of high-energy, high-flux, collimated synchrotrons radiation has extended the appli...
In recent years the technique of proton beam writing has established itself as a versatile method fo...
This thesis outlines a novel technique to economically pattern poly(methyl methacrilate) (PMMA) usin...
International audienceSelf-assembly of diblock copolymers (BCP) into periodic arrays is a promising ...
The production of high aspect ratio microstructures is a potential growth area. The combination of d...
A silicon mold was reproduced in stainless steel, iron and silver and it was shown that minimum stru...
Two- or multi-level microstructures are getting more important in several applications such as multi...
Poly(methyl methacrylate), PMMA, is a standard photoresist and is also a popular material out of whi...
Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are gr...
The chemically selective modification of polymer mixtures by monochromated soft X-rays has been expl...
<p>Spin-coating of PMGI and PMMA on a clean silicon wafer (a) is followed by exposure of the sample ...
During the last decade there has been a rapid development in Micro-Fabrication Technology driven by ...
We describe here initial studies of several commercially available poly(methylmethacrylate)s, PMMAs,...
In the present study, a modified deep X-ray lithography process is utilized for an efficient fabrica...
This thesis describes work performed on a novel form of surface-micromachining, called self-sacrific...
The availability of high-energy, high-flux, collimated synchrotrons radiation has extended the appli...
In recent years the technique of proton beam writing has established itself as a versatile method fo...
This thesis outlines a novel technique to economically pattern poly(methyl methacrilate) (PMMA) usin...
International audienceSelf-assembly of diblock copolymers (BCP) into periodic arrays is a promising ...
The production of high aspect ratio microstructures is a potential growth area. The combination of d...
A silicon mold was reproduced in stainless steel, iron and silver and it was shown that minimum stru...
Two- or multi-level microstructures are getting more important in several applications such as multi...
Poly(methyl methacrylate), PMMA, is a standard photoresist and is also a popular material out of whi...
Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are gr...
The chemically selective modification of polymer mixtures by monochromated soft X-rays has been expl...
<p>Spin-coating of PMGI and PMMA on a clean silicon wafer (a) is followed by exposure of the sample ...