Add to ORKGThe exposure effect of the reaction surface to ultraviolet (UV) light was studied for atomic layer deposition (ALD) of TiO2 film
International audienceThe aim of the this work was to study feasibility of titanium dioxide thin fil...
The field of photocatalysis can be traced back more than 80 years in history and during the past 20 ...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...
The exposure effect of the reaction surface to ultraviolet (UV) light was studied for atomic layer d...
The thin films ceramic oxide can be fabricated by ALD because this technique promises to control the...
Ceramic oxide thin films are an important material, with applications in many areas of science and t...
TiO2 is a widely studied material due to its optical and photocatalytic properties and its hydrophil...
Conventional atomic layer deposition (ALD) is a thermo-chemical process where co-reagents are sequen...
Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide ...
Atomic Layer Deposition (ALD) is a an excellent technique for depositing conformal thin films on com...
Abstract In this work processes of atomic layer deposition (ALD) of TiO2 and TiN using ALD method an...
Atomic Layer Deposition (ALD) is a an excellent technique for depositing conformal thin films on com...
Technological products in the fields of optoelectronic, energy conversion, nano-medical applications...
Atomic layer deposition (ALD) is an important technology for depositing functional coatings on acces...
Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (Cl) substrate by plasma-enhance...
International audienceThe aim of the this work was to study feasibility of titanium dioxide thin fil...
The field of photocatalysis can be traced back more than 80 years in history and during the past 20 ...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...
The exposure effect of the reaction surface to ultraviolet (UV) light was studied for atomic layer d...
The thin films ceramic oxide can be fabricated by ALD because this technique promises to control the...
Ceramic oxide thin films are an important material, with applications in many areas of science and t...
TiO2 is a widely studied material due to its optical and photocatalytic properties and its hydrophil...
Conventional atomic layer deposition (ALD) is a thermo-chemical process where co-reagents are sequen...
Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide ...
Atomic Layer Deposition (ALD) is a an excellent technique for depositing conformal thin films on com...
Abstract In this work processes of atomic layer deposition (ALD) of TiO2 and TiN using ALD method an...
Atomic Layer Deposition (ALD) is a an excellent technique for depositing conformal thin films on com...
Technological products in the fields of optoelectronic, energy conversion, nano-medical applications...
Atomic layer deposition (ALD) is an important technology for depositing functional coatings on acces...
Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (Cl) substrate by plasma-enhance...
International audienceThe aim of the this work was to study feasibility of titanium dioxide thin fil...
The field of photocatalysis can be traced back more than 80 years in history and during the past 20 ...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...