Abstract—In this paper, the on-wafer measurement of junction depletion capacitance is examined. This work provides an in-depth discussion of possible probing configurations which can be used. It outlines a method to consistently measure the junction capaci-tances accurately. The results from this method compare favorably with those extracted using S-parameter measurements. Addition-ally, methods are formulated to reduce the number of data points required for parameter extraction while at the same time main-taining a high model accuracy. Index Terms—Bipolar and BiCMOS processes, bipolar transis-tors, capacitance measurement, parameter estimation. NOMENCLATURE Propagation delay of a logic circuit. Forward transit time. Cutoff frequency. Base ...
Abstract—An improved two-frequency method of capacitance measurement for the high-k gate dielectrics...
With the employment of ultrathin, high dielectric constant gate materials in advanced semiconductor ...
The semiconductor industry is constantly striving to improve operation efficiency by enhancing produ...
n this work, a full two-port analysis of an RF C-V measurement set-up is given. This two-port analys...
Capacitance-voltage (C-V) gate characteristics of power metal-oxide-semiconductor field-effect trans...
This paper deals with the extraction of parasitic capacitances of interconnects in submicron layouts...
An analytical physics-based comprehensive base-collector junction capacitance model is presented. Th...
technical reportA novel approach to solving the accurate capacitance and resistance extraction probl...
A new capacitance-voltage profiling technique of semiconductor junctions is proposed for characteris...
Interconnection parasitic capacitance is the dominant delay and noise source in modem integrated cir...
Interconnection parasitic capacitance is the dominant delay and noise source in modern integrated ci...
In this paper we present a numerical simulation study of the scanning capacitance microscopy (SCM) m...
Abstract We describe a method to measure the gate capacitance and the gate current of transistors ...
A detailed analysis on the Sawyer–Tower method used in the measurement of large-signal output capaci...
VLSI interconnect capacitance is becoming more significant and also increasingly subject to process v...
Abstract—An improved two-frequency method of capacitance measurement for the high-k gate dielectrics...
With the employment of ultrathin, high dielectric constant gate materials in advanced semiconductor ...
The semiconductor industry is constantly striving to improve operation efficiency by enhancing produ...
n this work, a full two-port analysis of an RF C-V measurement set-up is given. This two-port analys...
Capacitance-voltage (C-V) gate characteristics of power metal-oxide-semiconductor field-effect trans...
This paper deals with the extraction of parasitic capacitances of interconnects in submicron layouts...
An analytical physics-based comprehensive base-collector junction capacitance model is presented. Th...
technical reportA novel approach to solving the accurate capacitance and resistance extraction probl...
A new capacitance-voltage profiling technique of semiconductor junctions is proposed for characteris...
Interconnection parasitic capacitance is the dominant delay and noise source in modem integrated cir...
Interconnection parasitic capacitance is the dominant delay and noise source in modern integrated ci...
In this paper we present a numerical simulation study of the scanning capacitance microscopy (SCM) m...
Abstract We describe a method to measure the gate capacitance and the gate current of transistors ...
A detailed analysis on the Sawyer–Tower method used in the measurement of large-signal output capaci...
VLSI interconnect capacitance is becoming more significant and also increasingly subject to process v...
Abstract—An improved two-frequency method of capacitance measurement for the high-k gate dielectrics...
With the employment of ultrathin, high dielectric constant gate materials in advanced semiconductor ...
The semiconductor industry is constantly striving to improve operation efficiency by enhancing produ...