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*Investigation on the formation of titanium nitride thin films on 304 type stainless steel using plasma focus device Narges Fani1 and Hadi Savaloni2* A 2.2-kJ Mather type plasma focus device charged at 18 kV was used to deposit titanium nitride on 304 type stainless steel substrates. The plasma focus device is fitted with solid titanium anode and operated with nitrogen as the filling gas. The process of deposition was done at room temperature, and samples were deposited at a constant distance and at different angles with respect to the anode axis. X-ray diffractometry (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), and energy dispersive X-ray analysis (EDX) were employed to characterize crystalline structure, morphology, nanostructure, distribution, and elemental composition of deposited films, respectively. As the ion flux and energy of the ions change with angular position from the head of the anode (titanium), it is observed that these changes directly affect both surface morphology and the nanostructure of the films. XRD patterns show the growth of polycrystalline titanium nitride thin films of different phases. AFM and SEM images show that the grain size is affected by the energy of ions that reached the surface. Grain size, average roughness, and root mean square decreased by increasing the angle with respect to the anode axis. EDX mapping verifies the elemental distributions of titanium nitride on the surface. In this work we have shown the possibility of production of titanium nitride thin films of different phases, using a Mather type plasma focus system